Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Preparation method of high-transmittance antireflection film with butterfly-compound-eye-imitated inverse opal secondary structure

A technology of inverse opal and secondary structure, which can be applied to devices, instruments, optical components, etc. for coating liquid on the surface, which can solve the problem of high reflectivity of battery panels

Active Publication Date: 2021-07-13
JILIN UNIV
View PDF7 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the prior art, the reflectivity of transparent parts such as battery panels and lenses is relatively high

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Preparation method of high-transmittance antireflection film with butterfly-compound-eye-imitated inverse opal secondary structure
  • Preparation method of high-transmittance antireflection film with butterfly-compound-eye-imitated inverse opal secondary structure
  • Preparation method of high-transmittance antireflection film with butterfly-compound-eye-imitated inverse opal secondary structure

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0039] Such as figure 2 with Figure 5 As shown, a method for preparing a butterfly-like compound eye anti-opal secondary structure high-transparency anti-reflection film of the present invention comprises the following steps:

[0040] Step S100, providing a substrate.

[0041] Specifically, the substrate can be a transparent substrate, and can be any substrate that needs to increase light transmission and reduce reflection. For example, the substrate is a silicon-based substrate or a glass substrate. When a silicon-based substrate is used, it can be applied to silicon-based thin film solar cells, and more More light passes through the film to the solar cell and is converted into electricity. In the embodiment of the present invention, in order to increase the transmittance of the substrate and reduce the reflectance of the substrate, any other substrates that need to increase the transmittance and reduce the reflectance can use the method of the present invention to form m...

specific Embodiment 1

[0085] 1. The microspheres are dissolved in the mixed solution of ethanol and water. The microspheres are silica spheres, and the radius size is between 3-4 microns. The ratio of microspheres, ethanol and water is 0.05:35:5, spin coating Speed ​​110 rpm, spin coating for 1 minute, acceleration time 10 seconds, deceleration time 10 seconds, place in a ventilated place for 9 minutes, spin coating again after evaporating solvent, repeat 4 times.

[0086] 2. Configure the film-forming solution, and the solution solidifies to form a film. The film-forming solution is epoxy resin. The film-forming solution is epoxy resin solution, the mass ratio of main agent and curing agent is 3:1, the spin coating speed is 800 rpm, spin coating for 1 minute, including acceleration time of 10 seconds, deceleration time of 10 seconds, curing temperature 85°C, curing time 6 hours, curing in blast drying oven.

[0087]3. Prepare the dissolving solution, acetone, ethyl acetate and butyl acetate acco...

specific Embodiment 2

[0090] 1. The microspheres are dissolved in the mixed solution of ethanol and water. The microspheres are polystyrene balls with a radius of 3-4 microns. The ratio of microspheres, ethanol and water = 0.05:36:6, spin coating Speed ​​120 rpm, spin coating for 1 minute, acceleration time 10 seconds, deceleration time 10 seconds, place in a ventilated place for 10 minutes, spin coating again after evaporating solvent, repeat 5 times.

[0091] 2. Configure the film-forming solution, and the solution solidifies to form a film. The film-forming solution is polydimethylsiloxane, the ratio of main agent and curing agent is 11:1, the spin coating speed is 900 rpm, spin coating for one minute, including acceleration time of 10 seconds, deceleration time of 10 seconds, curing temperature 80°C, curing time 120 minutes, curing in blast drying oven.

[0092] 3. Prepare the dissolving solution, acetone, ethyl acetate and butyl acetate according to the ratio of 6:4:1, spin coating speed 90 r...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
diameteraaaaaaaaaa
diameteraaaaaaaaaa
radiusaaaaaaaaaa
Login to View More

Abstract

The invention discloses a preparation method of a high-transmittance antireflection film with a butterfly-compound-eye-imitated inverse opal secondary structure. The method comprises the following steps: providing a substrate; depositing at least one layer of microspheres on the substrate; forming a film on the microspheres by adopting a film forming solution so as to fix the microspheres; removing the film layer on one side, deviating from the substrate, of the first layer of microspheres; and manufacturing a nanorod array on one side, deviating from the substrate, of the first layer of microspheres to obtain the high-transmittance antireflection film with the butterfly-compound-eye-imitated inverse opal secondary structure. According to the method, the microspheres are deposited on the substrate; the nanorod array is formed on the first layer of microspheres; the high-transmittance antireflection film with the butterfly-compound-eye-imitated inverse opal secondary structure is obtained; the convex microspheres can restrain specular reflection on the surface; and the microspheres can generate a gradual change refractive index effect, and the light antireflection effect is achieved.

Description

technical field [0001] The invention relates to the technical field of thin films, in particular to a method for preparing a butterfly-like compound eye anti-opal secondary structure high-transparency and anti-reflection thin film. Background technique [0002] In production and life, sunlight has been studied and utilized as a renewable energy source. Sunlight was an important lighting tool in ancient times and even modern times. It has been the law since ancient times to work at sunrise and rest at sunset. However, due to the existence of the propagation medium, light will be reflected and refracted when passing through different media. The existence of reflected light reduces the intensity of light, which is not conducive to the utilization and absorption of light. For the surface of solar cells, the reflection of sunlight on the surface reduces the absorption of light and reduces the conversion efficiency of solar panels; on the surface of optical lenses of high-precisi...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B05D5/06B05D1/00B05D3/06B05D3/02B05D7/24B05D1/36C09D163/00C09D183/04G02B1/118
CPCB05D5/063B05D1/005B05D3/067B05D3/0254B05D7/24B05D7/54C09D163/00C09D183/04G02B1/118
Inventor 牛士超丁汉良韩志武李博王泽薛浩周亮孟宪存张俊秋陈友迟德强刘德雷
Owner JILIN UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com