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Preparation method of SERS substrate based on 2D noble metal nanostructure

A nanostructure, precious metal technology, applied in metal material coating process, ion implantation plating, coating and other directions, can solve the problems of difficult to prepare plasmonic nanostructure array, difficult to evenly distribute hot spots, etc., to improve detection Sensitivity, excellent repeatability and stability, good periodicity

Active Publication Date: 2021-06-08
UNIV OF ELECTRONICS SCI & TECH OF CHINA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

For extremely low concentrations of target molecules, it is difficult to evenly distribute on these sparse and unevenly distributed hotspots, and practical SERS detection requires point-to-point and batch-to-batch reproducibility
Moreover, it is difficult to prepare closely arranged arrays of plasmonic nanostructures with sub-20 nanometer gaps on the surface of colloidal particles only by colloidal self-assembly technology.

Method used

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  • Preparation method of SERS substrate based on 2D noble metal nanostructure
  • Preparation method of SERS substrate based on 2D noble metal nanostructure
  • Preparation method of SERS substrate based on 2D noble metal nanostructure

Examples

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Embodiment 1

[0034] This embodiment provides a method for processing a SERS substrate based on a 2D noble metal nanostructure, which specifically includes the following steps:

[0035] S1, the surface is deposited with 300nm silicon oxide single crystal silicon (referred to as SiO 2 / Si) The substrate is successively placed in acetone, absolute ethanol and deionized water for ultrasonic cleaning for 10 minutes, taken out and dried with nitrogen, and treated with an ultraviolet ozone system for 30 minutes to make the surface of the substrate exhibit superhydrophilic properties;

[0036]S2. Using the colloidal self-assembly method to self-assemble a layer of polystyrene (PS) microsphere arrays in a regular and orderly arrangement on the surface of the substrate after step S1, and then place the substrate in a drying oven at 60°C for drying treatment 90min, and then further increase the temperature to 80°C for 5min heat treatment to obtain substrate A;

[0037] In the step S2, the specific s...

Embodiment 2

[0046] This embodiment provides a method for processing a SERS substrate based on a 2D noble metal nanostructure, which specifically includes the following steps:

[0047] S1, put 2 pieces of SiO 2 The / Si substrate was placed in acetone, absolute ethanol, and deionized water for 8 minutes to be ultrasonically cleaned, taken out and dried with nitrogen, and then treated with an ultraviolet ozone system for 25 minutes to make the surface of the substrate appear super-hydrophilic;

[0048] S2. Using the colloidal self-assembly method to self-assemble a layer of polystyrene (PS) microsphere arrays in a regular and orderly arrangement on the surface of the substrate after step S1, and then place the substrate in a drying oven at 60°C for drying treatment After 60 minutes, the temperature was further raised to 80°C for 5 minutes of heat treatment to obtain substrate A;

[0049] S3, using a plasma etching machine to carry out oxygen plasma etching on the substrate A prepared in ste...

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Abstract

The invention provides a preparation method of an SERS substrate based on a 2D noble metal nano structure, and belongs to the technical field of nano processing. The method specifically comprises the following steps that firstly, self-assembling of a layer of polymer microsphere array is conducted on the surface of a substrate, oxygen plasma etching is carried out to change the polymer microsphere array with a smooth surface into a plush polymer microsphere array, noble metal is deposited on the surface of the plush polymer microsphere array by taking the structure as a template, and the template is etched off to obtain the SERS substrate. The surface of the SERS substrate is paved with a noble metal layer with needle-shaped bulge structures, the gap between the needle-shaped bulge structures is smaller than 20 nm, the nanostructure is compact in arrangement, uniform in distribution and good in periodicity, a continuous and uniform enhanced electromagnetic field is favorably obtained, the detection sensitivity of an SERS device is remarkably improved, and excellent repeatability and stability are achieved. In addition, the preparation method can also achieve efficient machining and large-scale production, and the production cost is reduced.

Description

technical field [0001] The invention belongs to the technical field of nano-processing, and in particular relates to a preparation method of a SERS substrate based on a 2D noble metal nanostructure. Background technique [0002] Surface-enhanced Raman scattering (SERS) is one of the most impressive applications of plasmonic physics and is crucial for understanding various fundamental interfacial processes and interaction mechanisms. SERS enhances the local electromagnetic (EM) energy to 6 or more orders of magnitude through diverse metal nanogap (so-called hotspots), greatly enhancing the intermolecular and molecule-metal interactions, thus enabling single-molecule detection and Identify, and collect rich vibrational information with sub-nanometer precision. Commonly used SERS substrates include gold nanoparticles (AuNPs) arrays, silver nanoparticles (AgNPs) arrays, etc. Although gaps below 10 nm can be easily prepared on these substrates as enhancement units, the repeatabi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/24C23C14/30C23C14/18C23C14/20C23C14/04G01N21/65
CPCC23C14/24C23C14/30C23C14/18C23C14/20C23C14/042G01N21/658
Inventor 熊杰汪红波杜新川雷天宇陈伟晏超贻王显福
Owner UNIV OF ELECTRONICS SCI & TECH OF CHINA
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