Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

ZnS substrate-based multiband salt spray-resistant antireflection film and preparation method thereof

An anti-reflection coating, multi-band technology, used in sputtering, ion implantation, coating, etc., can solve problems such as poor environmental adaptability and poor test results, reduce the impact of stress, and improve the mechanism. characteristics, the effect of improving the firmness

Active Publication Date: 2021-02-05
江苏北方湖光光电有限公司
View PDF7 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

It is plated by vacuum evaporation by combining hard oxide, soft sulfide and fluoride film materials, such as: Y 2 o 3 Primer, combined with ZnS and YbF 3 The design of the anti-reflection coating in the visible, near-infrared, and mid-infrared bands, and the parts prepared with the aid of electron beam evaporation and ion beams, through engineering tests, it was found that the anti-reflection coating layer combined with zinc sulfide, zinc selenide, and chalcogenide glass substrates , the test results of damp heat and salt spray are not very good, especially the outermost layer has poor adaptability to the environment for a long time

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • ZnS substrate-based multiband salt spray-resistant antireflection film and preparation method thereof
  • ZnS substrate-based multiband salt spray-resistant antireflection film and preparation method thereof
  • ZnS substrate-based multiband salt spray-resistant antireflection film and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0028] The invention provides a method for preparing a multi-band salt spray resistant anti-reflection film based on a ZnS substrate, such as figure 1 As shown, the steps are as follows:

[0029] Step 1: Place the evaporation material required for plating and load the cleaned substrate in the coating machine;

[0030] Step 2: Wait for the vacuum to reach 5×10 -3 After Pa, for M and TiO 2 The crucible where it is located is fully pre-melted;

[0031] Step 3: Heat the substrate to 120°C, hold the temperature for 1200s, and wait for the vacuum degree to drop to 1×10 -3 Start plating after Pa;

[0032] Step 4: Start the RF ion source with the magnetron sputtering coater with RF source, the parameters are: BeamV=400~500V, BeamA=400~500mA, Gas1=45~50sccm, Gas2=0sccm, Gas3=8~10sccm , ion cleaning the substrate for 3 to 5 minutes;

[0033] Step 5: After cleaning, the plating of the primer layer M(La0.5Al1.5O3) is carried out, and the evaporation rate is 0.3nm / s. The parameters of...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
transmittivityaaaaaaaaaa
refractive indexaaaaaaaaaa
Login to View More

Abstract

The invention discloses a preparation method of a ZnS substrate-based multiband salt spray resistant antireflection film, and belongs to the technical field of optical films. The design theory of a multilayer antireflection film stretching across visible light, near-infrared light and medium-wave infrared bands is utilized, the design theory of the multilayer antireflection film on a high-refractive-index substrate is combined, a matching layer design for enhancing binding force is inserted, and refractive index matching with the substrate is achieved through an asymmetric equivalent layer andan asymmetric equivalent layer by adopting an asymmetric lambda / 4 film system. High-density oxygen ions emitted by an ion source are utilized to further oxidize the film, and meanwhile, high-energy argon ions and oxygen ions are utilized to pretreat the substrate. On one hand, the mechanism characteristics at the interface of the substrate and a film layer are improved, so that the bonding forcebetween the substrate and TiO2 is increased by a bonding layer; and on the other hand, the nodule defect with poor adhesive force generated in the coating process can be effectively removed before growth, the film layer is more compact, and meanwhile, the stress influence between the TiO2 and SiO2 is reduced, and the firmness, the damp and heat resistance and the salt mist resistance of the film layer are improved.

Description

technical field [0001] The invention relates to the technical field of optical thin films, in particular to a ZnS substrate-based multi-band salt fog resistant anti-reflection film and a preparation method thereof. Background technique [0002] With the development of optical instruments, the requirements for the environmental resistance of multi-band optical coating components are getting higher and higher, such as front windows or fairings in airborne, ship-borne and vehicle-mounted multispectral imaging systems. On the one hand, it is required that the coated components can withstand the test of harsh environments, and on the other hand, it is also required to keep their optical performance from degrading. As an important optical element in the optical system, CVD-ZnS windows have good mechanical properties and theoretically good optical properties, and are widely used in multi-spectral and wide-spectrum common-window imaging instruments and optoelectronic weapon systems....

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/28C23C14/02C23C14/08C23C14/10C23C14/54G02B1/115G02B1/14
CPCC23C14/28C23C14/022C23C14/083C23C14/10C23C14/08C23C14/024C23C14/54G02B1/115G02B1/14
Inventor 唐乾隆査家明李斯成汶韬陆丹枫颜刘兵石成
Owner 江苏北方湖光光电有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products