Insulated gate bipolar transistor and manufacturing method thereof
A technology of bipolar transistor and manufacturing method, which is applied in the direction of transistor, semiconductor/solid-state device manufacturing, semiconductor device, etc., can solve the problem of increasing the turn-on voltage drop and the turn-off time, and achieves low turn-on voltage drop and turn-off time. , the effect of increasing injection efficiency and short turn-off time
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[0089] Image 6 A schematic structural diagram of an insulated gate bipolar transistor is shown. The insulated gate bipolar transistor includes: P+ collector region 1, P-collector region 2, N+ buffer layer 3, N-type drift region 4, P-type body region 5, N+ emitter region 6, emitter metal 7. Gate layer 8, gate metal 9, collector metal 10. Wherein, the doping concentration of the P+ collector region 1 is higher than that of the P− collector region 2; a positive sign (+) indicates a higher doping concentration, and a negative sign (-) indicates a lower doping concentration.
[0090] In this example, the P+ collector region 1 and the P- collector region 2 are repeatedly set in the collector region, and the N+ buffer layer 3 is formed on the corresponding P+ collector region 1; the P-collector region 2 is N- Drift Zone 4. The N+ buffer layer can effectively increase the recombination rate of holes and reduce the turn-off time, thereby reducing the turn-off loss. At the same tim...
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