Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Mask based on electrostatic adsorption filtration and preparation method thereof

A technology of electrostatic adsorption and electrostatic filtration, which is applied in clothing, clothing, protective clothing, etc., and can solve problems such as poor wearing comfort, lack of layer-to-layer coordination, and no bactericidal effect

Pending Publication Date: 2020-12-22
HUNAN UNIV
View PDF2 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The above-mentioned prior art only generates an electrostatic field with a single charge, and has the following defects: (1) The electrostatic field strength is relatively weak, and cannot produce alternating adsorption or repulsion phenomena. As the wearing time increases, the filtering effect decays faster (2) The electrostatic field material selected has only adsorption effect, but no bactericidal effect, which will only breed a large number of bacteria on the surface of the mask; (3) The functional effect is simplistic, and there is a lack of synergy between layers. At the same time, the wearing comfort is not good

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Mask based on electrostatic adsorption filtration and preparation method thereof
  • Mask based on electrostatic adsorption filtration and preparation method thereof
  • Mask based on electrostatic adsorption filtration and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0033] (1) Use a graduated cylinder to take 10ml of DMF and place it in a 25ml beaker, add 0.8g of PVA to the above solution, stir the solution at 30° for 4 hours to form a uniform and transparent colloidal solution, and put the colloidal solution at 12kv Next, the acceptance distance was adjusted to 12 cm, electrospinning was performed at an injection speed of 0.4 ml / h, and the textile was dried in a vacuum environment at 80°.

[0034](2) Measure 10ml of deionized water solution, transfer it to a 25ml beaker, weigh 1g of polyacrylamide (APAM) and add it to deionized water, stir the solution for 2 hours to form a clear solution. Then disperse 0.8g of PVP in deionized aqueous solution to form a uniform and stable colloidal solution, which forms an anionic polymer precursor solution, which is marked as solution a.

[0035] (3) Measure 10 ml of deionized water solution, transfer it to a 25 ml beaker, weigh 1 g of polyquaternium salt and add it to deionized water, stir the solutio...

Embodiment 2

[0039] (1) Use a graduated cylinder to take 10ml of DMF and place it in a 25ml beaker, add 0.8g of PVA to the above solution, stir the solution at 30 ° for 4 hours to form a uniform and transparent colloidal solution, and put the colloidal solution at 12kv Next, the receiving distance was adjusted to 12 cm, electrospinning was performed at an injection speed of 0.4 ml / h, and the textile was dried in a vacuum environment at 80°.

[0040] (2) Measure 10ml of deionized water solution, transfer it to a 25ml beaker, weigh 1.2g of polyacrylamide (APAM) and add it to deionized water, stir the solution for 2 hours to form a clear solution. Then disperse 1g of PVP in deionized aqueous solution to form a uniform and stable colloidal solution, which forms an anionic polymer precursor solution, which is marked as solution a.

[0041] (3) Measure 10ml of deionized water solution, transfer it to a 25ml beaker, weigh 1.2g of polyquaternium salt into deionized water, and stir the solution for...

Embodiment 3

[0045] (1) Use a graduated cylinder to take 10ml of DMF and place it in a 25ml beaker, add 0.8g of PVA to the above solution, stir the solution at 30 ° for 4 hours to form a uniform and transparent colloidal solution, and put the colloidal solution at 12kv Next, the acceptance distance was adjusted to 12 cm, electrospinning was performed at an injection speed of 0.4 ml / h, and the textile was dried in a vacuum environment at 80°.

[0046] (2) Measure 10ml of deionized water solution, transfer it to a 25ml beaker, weigh 1.4g of polyacrylamide (APAM) into deionized water, stir the solution for 2 hours, and form a clear solution. Then disperse 1.2g of PVP in deionized aqueous solution to form a uniform and stable colloidal solution, which forms an anionic polymer precursor solution, which is marked as solution a.

[0047] (3) Measure 10ml of deionized aqueous solution, transfer it to a 25ml beaker, weigh 1.4g of polyquaternium salt into deionized water, and stir the solution for 2...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Diameteraaaaaaaaaa
Login to View More

Abstract

The invention discloses a mask based on electrostatic adsorption filtration and a preparation method thereof. The mask comprises an external anti-droplet wearing layer, a filter layer with an anionicpolymer and a cationic polymer as cores and a skin-friendly internal wearing layer, wherein a polymer PVA is used as the external anti-droplet wearing layer by an electrostatic spinning method, the filter layer is an antibacterial breathable nanofiber with an electrostatic field formed by combining the anionic polymer and the cationic polymer with the electrostatic spinning technology and deionized water, and the core filter layer with double effects of antibiosis and filtration is formed after simple heating and drying. The nanofiber layer with alternating electrostatic fields is used as thefilter layer, so that the filtration property is considered while germs can be effectively prevented, and the mask has long-term effective antibacterial ability; and meanwhile, the external wearing layer can effectively prevent droplets, and the internal wearing layer can improve the wearing comfort. The mask has antibacterial ability, protective ability and skin care ability, and is safe to use and wide in application.

Description

technical field [0001] The invention specifically relates to a mask based on electrostatic adsorption filtration and a preparation method thereof. Background technique [0002] Since 2019, the new coronavirus (COVID-19) has been rampant around the world, among which many particles in the air have become one of the main transmission media, and wearing a mask has become an important measure for effective prevention. However, the filtering effect of ordinary masks is only 35%, and the matching of N95 masks will invisibly increase the cost of prevention. At the same time, the poor air permeability of N95 will cause breathing discomfort when worn for a long time. At the same time, the rapid development of industrial civilization is bound to cause many environmental problems, and the particles and dust in the air will directly affect people's health. [0003] In the prior art, as disclosed in the patent No. CN102089039B, an electrostatically charged mask filter product and a meth...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): A41D13/11A41D31/04A41D31/02A41D31/30A41D31/26
CPCA41D13/1192A41D31/04A41D31/02A41D31/305A41D31/265
Inventor 李梓维黄建华黄明
Owner HUNAN UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com