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Sub-resolution auxiliary graph adding method and device and computer readable storage medium

An auxiliary graphics and sub-resolution technology, which is applied in computer-aided design, calculation, photolithographic process exposure devices, etc., to achieve the effect of improving placement accuracy, reducing errors, and improving the contrast of lithographic imaging

Active Publication Date: 2020-12-18
INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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Problems solved by technology

[0004] In order to solve the conflict between auxiliary graphics existing in the existing rule-based sub-resolution auxiliary graphics placement scheme and the problem of restricting the placement accuracy of sub-resolution auxiliary graphics, the present invention provides a sub-resolution auxiliary graphics adding method and device, The computer-readable storage medium can effectively improve the placement accuracy of the rule-based sub-resolution auxiliary graphics, and can significantly reduce the error in the collision cleaning process, so as to effectively solve at least one problem existing in the prior art

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  • Sub-resolution auxiliary graph adding method and device and computer readable storage medium
  • Sub-resolution auxiliary graph adding method and device and computer readable storage medium
  • Sub-resolution auxiliary graph adding method and device and computer readable storage medium

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Embodiment Construction

[0039] A method and device for adding sub-resolution auxiliary graphics and a computer-readable storage medium provided by the present invention will be explained and described in detail below in conjunction with the accompanying drawings.

[0040] Such as figure 1 As shown, some embodiments of the present invention can provide a method for adding sub-resolution auxiliary graphics based on evaluation values ​​and performing conflict resolution. The method for adding sub-resolution auxiliary graphics may include but not limited to the following steps.

[0041] Firstly, an initial layout to be added with sub-resolution auxiliary graphics and a list of rules for adding sub-resolution auxiliary graphics are provided. Before setting the auxiliary pattern, the method also includes the step of setting at least one detection point on the edge of the target pattern of the initial layout, and the target pattern is the pattern to be transferred to the wafer. In some embodiments of the p...

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Abstract

The invention discloses a sub-resolution auxiliary graph adding method and device and a computer readable storage medium. The method comprises the steps that sub-resolution auxiliary graphs are addedto an initial layout, evaluation values of the multiple sub-resolution auxiliary graphs are calculated respectively under the condition that the multiple added sub-resolution auxiliary graphs meet theset condition, and the corresponding sub-resolution auxiliary graphs are cleaned based on the evaluation values of the multiple sub-resolution auxiliary graphs, otherwise, the sub-resolution auxiliary graphes can be added continuously, and finally, the layout is output. The device can comprise an auxiliary graph adding module, an evaluation value calculation module, an auxiliary graph cleaning module and a final layout output module. According to the method, conflict clearing is innovatively carried out in the adding process of the sub-resolution auxiliary patterns, so that the workload and complexity of conflict clearing after all the sub-resolution auxiliary patterns are added can be effectively avoided, and a larger photoetching process window can be obtained; and thus, the photoetching imaging contrast of the target pattern is obviously improved.

Description

technical field [0001] The present invention relates to the technical field of lithographic resolution enhancement, and more specifically, the present invention relates to a method and device for adding sub-resolution auxiliary graphics, and a computer-readable storage medium. Background technique [0002] In the photolithography process, the photolithography process window of the dense pattern will be larger than that of the sparse pattern. It can be seen that the sparse graphics will limit the overall lithography process window. In order to solve this problem, some small graphics are added around the sparse graphics in the layout of the integrated circuit design, so that the sparse graphics look like dense graphics from an optical angle. The similar geometric distribution of the graphics can achieve the purpose of enhancing the imaging contrast of the sparse graphics and improving the overall process window. These small patterns must be smaller than the resolution of the ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20G06F30/392
CPCG03F7/70483G03F7/70616G06F30/392
Inventor 高澎铮韦亚一张利斌
Owner INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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