High-flux super-diffraction limit focal spot generating device capable of being specifically regulated and controlled

Abstract

The invention discloses a high-flux super-diffraction limit focal spot generating device capable of being specifically regulated and controlled. A method of the device comprises the following steps: firstly generating laser for generating high-flux dark spots, then enabling the laser to enter a spatial modulator loaded with a diffraction phase, splitting a light beam into a plurality of paths of laser arrays, enabling the laser arrays to enter a micro-lens array and focusing the laser arrays; meanwhile, filtering the light beam arrays on the Fourier surface of the micro-lens array, then enabling the light beam arrays to incident to a high-flux dark spot generation device for phase modulation, and finally focusing the light beam array to generate high-flux dark spots. The system is compactin design and high in integration level; high-speed specific regulation and control on dark spots can be realized while large-flux ultra-diffraction limit focal spots are generated; the method can beused for realizing parallel stimulated emission depletion microimaging and high-flux double-beam laser direct-writing photoetching, can realize the sub-50nm resolution of a parallel system, improves the system speed, and ensures the synchronous and stable improvement of the laser direct-writing processing speed and the imaging resolution.

Description

technical field [0001] The invention belongs to the field of optical engineering, in particular to a specific controllable high-throughput ultra-diffraction-limited focal spot generating device. Background technique [0002] Laser 3D printing and processing technology is a technology with micron processing accuracy and 3D printing capability. Mechanical, electronic and optical devices with corresponding scale structures can be fabricated flexibly. At the same time, the processing technology is simplified, and it is especially suitable for the research and trial production of new devices. However, this method is limited in principle by the diffraction limit, and the resolution is difficult to break through sub-hundred nanometers. To realize direct writing with nanometer precision, it is necessary to break through the optical diffraction limit, so it is necessary to develop optical direct writing technology based on super-resolution laser technology. [0003] On the princip...

AI Technical Summary

Problems solved by technology

[0004] At present, the development of this technology is only a resolution of tens of nanometers, and its speed is very slow. It is a low-throughput direct writing technology.

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