Process for deeply removing oxalic acid

A technology for removing oxalic acid, which is applied in photography technology, photography auxiliary technology, process efficiency improvement, etc., can solve the problem of excessive residue of oxalic acid in medium, achieve high removal rate, low cost, avoid toxicity and secondary pollution problem effect

Pending Publication Date: 2020-12-04
HUNAN INSTITUTE OF ENGINEERING
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to overcome the defects of the prior art and provide a deep oxalic acid removal process to solve the problem of excessive residual oxalic acid in the liquid after nickel removal

Method used

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  • Process for deeply removing oxalic acid

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Experimental program
Comparison scheme
Effect test

Embodiment 1

[0014] Embodiment 1, a kind of technology of depth removing oxalic acid is as follows:

[0015] a. Weigh 1L of the nickel-removed solution into a container, place it in a temperature environment of -5°C, let it stand for 8 hours, take it out and filter it quickly, and keep the mother liquor. The oxalic acid content in the mother liquor is 2.1 g / L, and the precipitate on the filter paper The product was dried at 40°C to obtain the finished product of oxalic acid;

[0016] b. Add 5.83g of industrial copper sulfate pentahydrate containing 23% copper to the above mother liquor, raise the temperature to 40°C and stir for 1 hour, then filter, and dry the light blue-green precipitate on the filter paper at 40°C to obtain the copper oxalate product.

[0017] After analysis, the content of oxalate in the solution was 0.2 g / L. The removal rate of oxalic acid in the treated liquid after nickel removal is 90.47%.

Embodiment 2

[0018] Embodiment 2, a kind of technology of depth removing oxalic acid is as follows:

[0019] a. Weigh 1L of the nickel-removed solution into a container, place it in an environment with a temperature of 15°C, let it stand for 24 hours, take it out and filter it quickly, and keep the mother liquor. The oxalic acid content in the mother liquor is 29.3 g / L, and the precipitate on the filter paper The product was dried at 80°C to obtain the finished product of oxalic acid;

[0020] b. Add 97.7g of industrial copper sulfate pentahydrate containing 23% copper to the above mother liquor, raise the temperature to 80°C and stir for 5 hours, then filter, and dry the light blue-green precipitate on the filter paper at 80°C to obtain copper oxalate product.

[0021] After analysis, the content of oxalate in the solution was 1.8g / L, and the removal rate of oxalic acid in the solution after nickel removal was 93.86%.

Embodiment 3

[0022] Embodiment 3, a kind of technology of depth removing oxalic acid is as follows:

[0023] a. Weigh 1L of the nickel-removed solution into a container, place it in a temperature environment of -3°C, let it stand for 12 hours, take it out and filter it quickly, and leave the mother liquor. The oxalic acid content in the mother liquor is 3.7 g / L. The precipitate was dried at 70°C to obtain the finished product of oxalic acid;

[0024] b. Add 14.4g of industrial copper sulfate pentahydrate containing 23% copper to the above mother liquor, raise the temperature to 70°C and stir for 2 hours, then filter, and dry the light blue-green precipitate on the filter paper at 70°C to obtain copper oxalate product.

[0025] After analysis, the content of oxalate in the solution was 0.17g / L, and the removal rate of oxalic acid in the solution after nickel removal was 95.38%.

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Abstract

The invention relates to a process for deeply removing oxalic acid. The process comprises the following specific steps that a, a nickel-removed solution containing oxalic acid is placed in an environment with the temperature of 5 DEG C below zero to 15 DEG C for standing for 8 to 24 hours, then is taken out and is quickly filtered, mother liquor is retained, and precipitates on filter paper are dried at the temperature of 40 to 80 DEG C to obtain an oxalic acid finished product; and b, industrial copper sulfate pentahydrate containing 23% of copper is added into the mother liquor, the molar ratio of the industrial copper sulfate pentahydrate to oxalate is 1-2: 1, the temperature is increased to 40 to 80 DEG C, a stirring reaction is conducted for 1 to 5 hours, then filtering is conducted,and light blue-green precipitates on filter paper are dried at the temperature of 40 to 80 DEG C to obtain a copper oxalate product. The process is simple and reliable, the removal rate of the oxalicacid in the solution can reach 99.7% at most, and the content of the oxalic acid in the solution can be reduced to 0.08 g/L; and the problems of toxicity and secondary pollution caused by lead are avoided, the use of a calcium-containing precipitant is also solved, the removal rate is high, and the cost is low.

Description

technical field [0001] The invention belongs to the field of recovery and utilization of secondary resources in the copper smelting industry, and in particular relates to a process for deeply removing oxalic acid. Background technique [0002] At present, the production capacity of the copper smelting system of a smelting company in Baiyin has reached an annual output of 100,000 tons of cathode copper, and the electrolytic workshop needs to process about 8,000 m 3 , the solution contains about 20g / L Ni, about 0.52g / L Cu, and about 250g / L free sulfuric acid. Since the solution contains excessive nickel ions, if it is directly returned to the electrolytic cycle, the quality of cathode copper will be affected. Therefore, the solution generally needs to be treated with nickel removal to reduce the nickel concentration in the final copper removal solution to below 10g / L. , in order to meet the electrolyte configuration requirements. [0003] At present, the system uses oxalic a...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C25C7/06C25C1/12
CPCC25C7/06C25C1/12Y02P10/20
Inventor 伍水生王军易兵兰东辉谭年元
Owner HUNAN INSTITUTE OF ENGINEERING
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