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Display panel and preparation method thereof

A technology for display panels and array substrates, which is applied in semiconductor/solid-state device manufacturing, electrical components, electric solid-state devices, etc., and can solve the problems of complex preparation process, high cost of color film, high reflection effect, etc.

Inactive Publication Date: 2020-10-30
WUHAN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
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  • Application Information

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Problems solved by technology

Color film is usually prepared by spin coating or inkjet printing, and due to the nature of color film itself, there is still a high reflection effect on light-emitting diodes and ambient light, and the cost of preparing color film is high and the preparation process is complicated. The preparation method adopted by the film will reduce the yield rate of the color film, which in turn will reduce the yield rate of the display panel

Method used

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  • Display panel and preparation method thereof
  • Display panel and preparation method thereof
  • Display panel and preparation method thereof

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Embodiment Construction

[0033] The following will clearly and completely describe the technical solutions in the embodiments of the application with reference to the drawings in the embodiments of the application. Apparently, the described embodiments are only some of the embodiments of the application, not all of them. Based on the embodiments in this application, all other embodiments obtained by those skilled in the art without making creative efforts belong to the scope of protection of this application.

[0034] see figure 1 , figure 1 It is a cross-sectional view of the first structure of the display panel provided in this application. The present application provides a display panel 10 . The display panel 10 includes an array substrate 100 , a light emitting layer 200 and an antireflection structure 300 .

[0035] The array substrate 100 includes a substrate 110 and a thin film transistor 120 . The TFT 120 is disposed on the substrate 110 . The TFT 120 includes an active layer 121 , a gat...

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Abstract

The invention provides a display panel and a preparation method thereof. The display panel comprises an array substrate, a light-emitting layer and an antireflection structure, the light-emitting layer is arranged on the upper surface of the array substrate, the light-emitting layer comprises a plurality of light-emitting parts, the antireflection structure is arranged on the light-emitting layer,the antireflection structure comprises black matrix layers arranged in an array mode and scattering layers arranged between the black matrix layers, the scattering layers and the light-emitting partsare arranged in a one-to-one correspondence mode, and scattering particles are arranged in the scattering layers. According to the display panel, the black matrix layers and the scattering layers arearranged in the display panel to serve as the antireflection structure, the depolarization of the display panel is achieved, the preparation process and production cost of the display panel are reduced, the reflection of ambient light is reduced, and the yield of the display panel is increased.

Description

technical field [0001] The present application relates to the field of display technology, in particular to a display panel and a manufacturing method thereof. Background technique [0002] At present, the color filter is usually used to replace the polarizer. The basic structure of the color filter includes a red filter part, a blue filter part, a green filter part and a black matrix, which are respectively connected with the red sub-pixel, green sub-pixel and blue sub-pixel of the light-emitting diode. The sub-pixel units correspond to form a color filter functional layer. Color film is usually prepared by spin coating or inkjet printing, and due to the nature of color film itself, there is still a high reflection effect on light-emitting diodes and ambient light, and the cost of preparing color film is high and the preparation process is complicated. The preparation method adopted by the film will reduce the yield rate of the color film, thereby reducing the yield rate o...

Claims

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Application Information

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IPC IPC(8): H01L51/52H01L51/56H01L27/32H01L33/58H01L27/15
CPCH01L33/58H01L27/156H01L2933/0058H10K59/12H10K50/865H10K50/86H10K59/1201H10K71/00
Inventor 陈泽升赵勇鲜于文旭
Owner WUHAN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
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