Anode structure and method for electroforming ultra-thin metal mesh
A technology of ultra-thin metal and anode structure, which is applied in the direction of electrodes, electroforming, electrolysis, etc., and can solve the problems of complex photolithography film-making process, dependence on operation steps, high process cost, etc.
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[0038] Hereinafter, taking the processing of a grid metal grid as an example, the embodiment of the present invention will be further described in conjunction with the accompanying drawings.
[0039] Such as figure 1 and figure 2 As shown, an anode structure for electroforming an ultra-thin metal grid, which includes a stirring paddle 2 with a rectangular cross section, embedded in the center of the bottom plane of the paddle 2, and the bottom edge is flush with the bottom end surface of the paddle 2 The linear ultramicro anode 4, the flexible electrical insulating layer 3 closely attached to the outside of the stirring paddle 2 and the linear ultramicro anode 4; the material of the linear ultramicro anode 4 is metal platinum; the flexible electrical insulating layer 3 is made of silica gel , with a thickness of 0.2mm, and a transparent slit 3-1 with a distance of 0.5mm and a width of 0.2mm is provided on the attachment surface of the paddle 2 bottom plane; the material of t...
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