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Semiconductor processing equipment

A processing equipment and semiconductor technology, applied in semiconductor/solid-state device manufacturing, metal material coating process, gaseous chemical plating, etc., can solve the problems of poor gas uniformity, etc., and achieve easy implementation, cost control, The effect of simple structure

Pending Publication Date: 2020-09-29
BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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  • Abstract
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AI Technical Summary

Problems solved by technology

[0005] The invention discloses a semiconductor processing equipment to solve the problem of poor effect of improving the gas uniformity in the reaction chamber in the existing semiconductor processing equipment

Method used

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  • Semiconductor processing equipment
  • Semiconductor processing equipment
  • Semiconductor processing equipment

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Embodiment Construction

[0020] In order to make the purpose, technical solution and advantages of the present invention clearer, the technical solution of the present invention will be clearly and completely described below in conjunction with specific embodiments of the present invention and corresponding drawings. Apparently, the described embodiments are only some of the embodiments of the present invention, but not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0021] The technical solutions disclosed by various embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings.

[0022] Such as Figure 1 to Figure 4 As shown, the embodiment of the present invention discloses a semiconductor processing equipment. The disclosed semiconductor processing equipment can perfo...

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Abstract

The invention discloses semiconductor processing equipment. The semiconductor processing equipment comprises a reaction chamber and a process pipe, wherein at least part of the process pipe is positioned in the reaction chamber, the process pipe is provided with an accommodating part, an air inlet part and an air outlet part, the air inlet part is provided with an air inlet, the air outlet part isprovided with an air outlet, the process pipe is provided with a plurality of air inlets and a plurality of air outlets, the air inlets and the air outlets are distributed at intervals in the axis direction of the process pipe, the air inlets are communicated with an accommodating part, and the air outlets are communicated with the accommodating part. The semiconductor processing equipment is advantaged in that a problem that in existing semiconductor processing equipment, the effect of improving the uniformity of gas in the reaction chamber is poor can be solved.

Description

technical field [0001] The invention relates to the technical field of semiconductor equipment, in particular to a semiconductor processing equipment. Background technique [0002] With the progress of science and technology, the design of semiconductor equipment is developing rapidly towards the direction of high density and high integration. Among all semiconductor special equipment, semiconductor processing equipment is one of the important process equipment in the pre-process of integrated circuit production line, and it is also a key factor affecting the quality of wafer heat treatment process. [0003] During the processing of the wafer, the wafer needs to be transferred to the reaction chamber of the semiconductor processing equipment, and undergo heat treatment processes such as high-temperature annealing, oxidation, or diffusion to meet the requirements of the next step. Normally, maintaining and improving the yield rate of wafers is very important to the semicondu...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/67C23C16/54C23C16/455
CPCH01L21/67207C23C16/54C23C16/45502
Inventor 董金卫
Owner BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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