Secondary washing device for electrolytically refined metal plate

Abstract

The invention belongs to the technical field of chemical engineering, and particularly relates to a secondary washing device for an electrolytically refined metal plate. The device comprises a conveying mechanism, wherein a first washing device, a stripping system and a second washing device are arranged along a conveying path of the conveying mechanism, the first washing device is used for washing a metal plate attached to a cathode plate, the stripping system is used for stripping the metal plate on the surface of the cathode plate, the second washing device is used for washing the strippedmetal plate, and the conveying mechanism sequentially passes through the first washing device, the stripping system and the second washing device. According to the secondary washing device, a cleaningdevice and a washing device are sequentially arranged in the conveying direction of the conveying mechanism, the cleaning device and the washing device respectively carry out preliminary washing on the metal plate and secondary washing on the stripped metal plate, residual electrolyte on the inner side surface of the metal plate can be completely removed, and the product quality is guaranteed; and in addition, an exhaust pipe is arranged in a washing chamber, acid mist generated during washing can be discharged into an exhaust system in time, and a good production environment is ensured.

Description

technical field [0001] The invention belongs to the technical field of chemical industry, in particular to an electrolytic refining metal plate secondary washing device. Background technique [0002] Hydrometallurgy is a commonly used metal purification method. Taking copper as an example, in the copper electrolytic refining process using permanent stainless steel cathode plates, in order to obtain qualified electrical copper, it is necessary to wash the electrical copper deposited on the surface of the cathode plate. Remove impurities such as electrolyte remaining on the surface. Most of the existing technologies only have a first cleaning device for cleaning the copper attached to the surface of the cathode plate, the cleaning effect is poor, and the electrolyte remaining on the surface of the copper plate will affect the quality of the finished copper plate. [0003] For example, a Chinese utility model patent discloses a cathode stripping unit [application number: 20162...

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Problems solved by technology

[0004] In this utility model patent, when the first cleaning device is used to clean the electric copper, the electric copper is still attached to the cathode plate, so this cleaning method cannot clean the residual electrolyte in the edge strip of the cathode plate, which will cause the electric copper after stripping The surface contains residual electrolyte, so it is necessary to provide a device to clean the inner side of the stripped copper again

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