A special etching equipment for quartz wafer production and its application method
A technology of quartz wafers and etching equipment, applied in the directions of crystal growth, single crystal growth, single crystal growth, etc., can solve the problem that the cleaning solution and etching solution are difficult to recover and process, the etching depth is difficult to control, and the labor of the staff is increased. Intensity and other issues, to achieve the effect of easy control of etching time, uniform and controllable output, and improved etching quality
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[0026] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.
[0027] see Figure 1-6 , the present invention provides a technical solution: a special etching equipment for quartz wafer production, including a stand 1, a drive mechanism and a conveyor belt 5 are arranged on the stand 1, and the drive mechanism is located above the conveyor belt 5, and the two sides of the drive mechanism Both sides are equipped with connecting rod assemblies 2, and the connecting rod assembly 2 on the right is connected to the etching solution...
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