Preparation method of suspended graphene film structure

Abstract

The invention discloses a preparation method of a suspended graphene film structure, which comprises the following steps: 1, coating PMMA on the surface of a copper-based graphene film to obtain a copper-based / graphene / PMMA structure, 2, putting the copper-based / graphene / PMMA structure obtained in the step 1 into a copper corrosive liquid, and etching to remove the copper substrate to obtain a PMMA / graphene structure, 3, transferring the PMMA / graphene structure obtained in the step 2 to a silicon-based cavity structure to obtain a PMMA / graphene / silicon structure, and 4, spin-coating a photoresist on the PMMA surface of the PMMA / graphene / silicon structure obtained in the step 3, photoetching and developing, patterning the graphene structure by using oxygen plasma, and removing the photoresist by using acetone to obtain the suspended graphene film structure. According to the method, the processing and manufacturing difficulty of the suspended graphene can be reduced, the coverage integrity of the suspended graphene film structure is ensured, and the success rate is high.

Description

technical field [0001] The invention relates to the technical field of graphene pressure sensors, in particular to a method for preparing a suspended graphene film structure. Background technique [0002] Graphene film has a series of advantages such as high strength, 2D properties, high sub-mobility, and is sensitive to pressure and impermeable to gas; in addition, compared with the traditional silicon film structure, the Young's modulus of 1TPa And the ultra-thin thickness of 0.335nm endows the graphene film with extreme mechanical properties. The excellent electrical and mechanical properties enable graphene films to be used in the manufacture of high-sensitivity suspended graphene micro-pressure sensors. [0003] At present, one of the key technologies for manufacturing suspended graphene micro-pressure sensors is to completely cover the graphene film on the cavity of the substrate structure and pattern it into a suitable shape, but the transfer of ultra-thin graphene f...

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Problems solved by technology

[0003] At present, one of the key technologies for manufacturing suspended graphene micro-pressure sensors is to completely cover the graphene film on the cavity of the substrate structure and pattern it into a suitable shape, but the transfer of ultra-thin graphene film with nanometer thickness On the silicon-based cavity with a lateral dimension of tens of microns, and subsequent operations such as gluing, photolithography, development, and patterning of the graphene film must be directly performed. At this time, the integrity of the graphene film structure must be ensured. low success rate

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