Moisturizing and easy-to-wash skin care mud mask and preparation method thereof

Abstract

The invention provides a moisturizing and easy-to-wash skin care mud mask and a preparation method thereof. The skin care mud mask includes the following components in percentages by weight: 1%-20% ofwax, 0.1%-10% of a skin feel modifier, 1%-30% of vegetable oil, 1%-15% of a polyol, 0.1%-3% of a moisturizer, 0.1%-5% of a preservative, 1%-5% of an emulsifier, 1%-10% of kaolin, and the balance of water. The preparation method comprises the following steps: dispersing the skin feel modifier in the water under stirring, performing a hydration reaction, after the hydration is fully completed, adding the polyol, the moisturizer and the preservative to obtain an A group water phase, performing heating, and performing stirring for uniform dissolution; mixing the wax, the vegetable oil, the emulsifier and the preservative to obtain a B group oil phase, performing heating to 80-85 DEG C, after the B group oil phase is uniformly dissolved, mixing the B group oil phase and the A group water phase, and performing emulsification; and adding the kaolin into the mixed solution of the A group water phase and the B group oil phase, and performing uniform dispersion to obtain the moisturizing and easy-to-wash skin care mud mask.

Description

Technical field [0001] The invention relates to the field of cosmetics, in particular to a moisturizing and easy-rinsing skin care mud film and a preparation method thereof. Background technique [0002] In recent years, mud film products have become popular. The general method of use is to apply a thick layer on the face to completely block the skin from the outside world. Leave it for 15-20 minutes. After the nutrients are slowly absorbed by the skin, wash it off. The mud film is rich in minerals and nutrients, which can strongly absorb dirt in the skin and help the skin to remove dirt. Its main function is cleaning. With the diversification of mud film products, people are gradually paying attention to the experience, practicality and mildness of these products. People prefer mud masks mainly because they can cleanse deeply, and also have various additional functions such as moisturizing, whitening, and skin tightening. The traditional mud film is thickened by adding a larg...

AI Technical Summary

Problems solved by technology

However, the formula of the mud mask of the above-mentioned patent includes a large amount of bentonite and kaolin, and the bentonite will have a sense of tension and discomfort during the drying process of the mud mask; there is a risk of difficult cleaning and excessive cleaning, thereby limiting the frequency of product use; For easy cleaning, surfactants are added, but the surfactants themselves are also irritating to a certain extent, which affects the mildness of the mud film

[0004] At present, there are few mud mask products on the market that are gentle, safe, and can be used frequently, and they are basically not easy to clean after application. If they are over-cleaned, they will damage the skin; after washing, they will cause facial tightness and other problems.

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