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Cleaning method for OLED evaporation equipment tantalum crucible surface material residues

A technology of surface material and tantalum crucible, which is applied in the field of OLED panel production, can solve problems affecting the purity of evaporation materials and the stability of product yield, and achieve the effects of increasing the number of repeated cleanings, easy cost control, and high operating efficiency

Inactive Publication Date: 2020-07-10
四川富乐德科技发展有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The purpose of the present invention is to solve the problem that in the prior art, when the tantalum crucible is used for a long time, the imprint will volatilize under the action of high temperature in the machine, which will affect the purity of the evaporation material and thus affect the stability of the product yield, and provide a Cleaning method for material residues on the surface of tantalum crucible of OLED evaporation equipment

Method used

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  • Cleaning method for OLED evaporation equipment tantalum crucible surface material residues
  • Cleaning method for OLED evaporation equipment tantalum crucible surface material residues
  • Cleaning method for OLED evaporation equipment tantalum crucible surface material residues

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Embodiment 1

[0041] A method for cleaning material residues on the surface of a tantalum crucible of OLED evaporation equipment provided by a preferred embodiment of the present invention comprises the following steps:

[0042] Remove the film layer on the inner surface and outer surface of the tantalum crucible after evaporation, so that the body and the mark are revealed;

[0043] According to the size and structure of the tantalum crucible parts, select the corresponding water blasting equipment;

[0044] According to the precision requirements and structural characteristics of the tantalum crucible, select the corresponding sand material and blasting pressure for water blasting treatment;

[0045] Appearance and roughness inspection of tantalum crucibles treated by water blasting;

[0046] Rinse the qualified tantalum crucible with deionized water.

[0047] The material of the sand material is alumina. The particle size of the sand material is 50-80 microns.

[0048] The specific c...

Embodiment 2

[0054] Another embodiment of the present invention provides a method for cleaning material residues on the surface of a tantalum crucible of OLED evaporation equipment, comprising the following steps:

[0055] Remove the film layer on the inner surface and outer surface of the tantalum crucible after evaporation, so that the body and the mark are revealed;

[0056] According to the size and structure of the tantalum crucible parts, select the corresponding water blasting equipment;

[0057] According to the precision requirements and structural characteristics of the tantalum crucible, select the corresponding sand material and blasting pressure for water blasting treatment;

[0058] Appearance and roughness inspection of tantalum crucibles treated by water blasting;

[0059] Rinse the qualified tantalum crucible with deionized water.

[0060] The material of the sand material is silicon dioxide.

[0061] The specific conditions of the water blasting treatment are: the sand...

Embodiment 3

[0066] Another embodiment of the present invention provides a method for cleaning material residues on the surface of a tantalum crucible of OLED evaporation equipment, comprising the following steps:

[0067] Remove the film layer on the inner surface and outer surface of the tantalum crucible after evaporation, so that the body and the mark are revealed;

[0068] According to the size and structure of the tantalum crucible parts, select the corresponding water blasting equipment;

[0069] According to the precision requirements and structural characteristics of the tantalum crucible, select the corresponding sand material and blasting pressure for water blasting treatment;

[0070] Appearance and roughness inspection of tantalum crucibles treated by water blasting;

[0071] Rinse the qualified tantalum crucible with deionized water.

[0072] The material of the sand material is alumina.

[0073] The specific conditions of the water blasting treatment are: the sand materia...

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Abstract

The invention discloses a cleaning method for OLED evaporation equipment tantalum crucible surface material residues and relates to the technical field of OLED panel production. The cleaning method includes the following steps that films on the inner surface and the outer surface of a tantalum crucible are removed after evaporation use, and a body and a stamp are exposed out; corresponding water sand spraying equipment is selected according to the size structure of tantalum crucible parts; corresponding sand materials and sand blasting pressure are selected for conducting water sand spraying treatment according to precise requirements and structural features of the tantalum crucible; appearance and roughness detection is conducted on the tantalum crucible obtained after water sand sprayingtreatment; and the tantalum crucible which is detected to be qualified is subjected to deionized water flushing. The surface of the crucible treated through the method has the beneficial effects thatthe color is uniform, the surface cleanliness is high, losses are small, and the service life is long.

Description

technical field [0001] The invention belongs to the technical field of OLED panel production, and in particular relates to a method for cleaning material residues on the surface of a tantalum crucible of OLED evaporation equipment. Background technique [0002] Due to its high purity, good heating consistency, excellent thermal conductivity and thermal shock resistance, tantalum crucible is used as the main container for evaporation elements in OLED (organic light-emitting display) production lines, and due to its strong chemical inertness, it can be used at high temperature It is not easy to react chemically, so it is widely used in OLED evaporation equipment. However, in the actual production process, the tantalum crucible is affected by the evaporation material, and different degrees of reaction and penetration between the body and the evaporation material occur, making it lose its metallic luster and showing obvious marks. When the tantalum crucible is used for a long t...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B24C1/08B24C7/00
CPCB24C1/086B24C7/0007
Inventor 邱俊惠朝先周涛
Owner 四川富乐德科技发展有限公司
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