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Diffraction device and method for nondestructive testing of orientation uniformity of crystals in workpiece

A diffraction device and diffractometer technology, which is applied in material analysis using radiation diffraction, measuring devices, material analysis using wave/particle radiation, etc., can solve problems such as long time-consuming, long detection time, and low detection efficiency

Active Publication Date: 2020-07-07
NO 59 RES INST OF CHINA ORDNANCE IND
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, using this short-wavelength X-ray diffractometer for detection requires scanning and measuring WKα at 21 K angles at a layer depth 1 After the diffraction intensity, move another layer of the sample to the center of the diffractometer circle, and repeat the scanning at the depth of this layer to measure WKα at 21 K angles 1 Diffraction intensity, until the K-angle scanning measurement of 11 deep layers is completed, and it takes about 0.5 minutes to measure the WKα1 diffraction intensity at each K-angle deep in each layer, a total of about 21*11*0.4 minutes=92 minutes , takes too long
Obviously, this method is neither suitable for the rapid characterization of the uniformity of crystal orientation inside centimeter-level thickness samples, nor is it suitable for the online nondestructive testing of the uniformity of crystal orientation and the uniformity of internal texture in workpieces of commonly used materials on the production line.
In addition, other existing equipment or methods used to detect the uniformity of crystal orientation in centimeter-level samples also have the problems of long detection time and low detection efficiency. It is a challenge in this field to shorten the detection time to less than two minutes. Big technical difficulty

Method used

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  • Diffraction device and method for nondestructive testing of orientation uniformity of crystals in workpiece
  • Diffraction device and method for nondestructive testing of orientation uniformity of crystals in workpiece
  • Diffraction device and method for nondestructive testing of orientation uniformity of crystals in workpiece

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Embodiment 1

[0050] The focus of this embodiment is to introduce the detection equipment used in the method of the present invention-diffraction device.

[0051] A diffractive device such as figure 1 , Figure 3 to Figure 6 shown. The device includes: a heavy metal anode target X-ray tube 1, an incident collimator 2, a sample stage 3 for installing a sample 4, each detection unit has an array detector 5 for single photon measurement and a receiving array collimator fixed in front of the array detector 5. Straightener 6, main control computer 7, high voltage generator 8, controller 9, remote operation terminal 10, X-ray shielding shield 12, θ angle rotation mechanism 13 of heavy metal anode target X-ray tube 1, receiving array collimator 6 + The array detection system composed of the array detector 5, the 2θ angle rotation mechanism 14 of the array detection system, the β angle rotation mechanism 15 of the array detection system and the frame 16 of the device.

[0052] Among them, the di...

Embodiment 2

[0065] A method for non-destructive testing of the uniformity of crystal orientation inside a workpiece, using the diffraction device in Example 1 to detect the uniformity of crystal orientation inside a cold-rolled 25mm thick 2024 aluminum plate, see Figure 7 As shown, the specific steps are as follows:

[0066] Step 1: Select the diffracted short-wavelength characteristic X-rays, and set the wavelength λ 0 =0.0211nm, set photon energy as E 0 =59.3kev;

[0067] Step 2: Use XRD detection to analyze the crystal orientation distribution of the 2024 aluminum plate, the measured {111} pole figure of the middle layer and its analysis results, such as figure 2 shown, select figure 2 The direction of the point shown in 17 on the pole figure (the intersection of the outer circle of the pole figure and the transverse TD direction) is taken as the direction of the diffraction vector Q to be measured, and Q(α 0 ,β 0 )=Q(0,0), that is, the direction angle (orientation angle) is α0...

Embodiment 3

[0077] A method for non-destructively testing the uniformity of crystal orientation inside a workpiece, which is used to detect the uniformity of crystal orientation inside a cold-rolled 20mm thick 7075 aluminum plate in linear motion.

[0078] Detection method, step and used diffraction device are the same as embodiment 1 and embodiment 2 in the present embodiment, difference is following parameter selection:

[0079] select figure 2 The direction of the point shown in 18 (the angle with the transverse TD direction is 68° and the intersection point of the outer circle of the polar figure) is taken as the direction of the diffraction vector Q to be measured, that is, the diffraction vector Q(α 0 ,β 0 )=Q(0,68°);

[0080] In this embodiment, the distance from the center of the diffractometer circle of the diffractometer to the window of the W target X-ray tube is 150 mm, the incident collimator is made of tungsten alloy, and its aperture is a rectangular hole. The angle is ...

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Abstract

The invention discloses a diffraction device and a method for nondestructive testing of orientation uniformity of crystals in a workpiece, and the device comprises: an X-ray irradiation system which irradiates X-rays to a measurement part of a measured sample; an X-ray detection system for simultaneously detecting a plurality of diffracted X-rays formed by diffracting the X-rays from a plurality of locations of the sample to be measured and measuring the X-ray diffraction intensity distribution of the sample to be measured, wherein the detected X-rays are short-wavelength characteristic X-rays, and the X-ray detection system is an array detection system; the method comprises the following steps: selecting short-wavelength characteristic X-rays, carrying out texture analysis on a sample tobe detected, and determining a diffraction vector Q to be detected; and acquiring the X-ray diffraction intensity of the corresponding part of the measured sample. According to the invention, the internal crystal orientation uniformity of the centimeter-level thickness workpiece in the whole thickness direction can be rapidly and nondestructively detected, and online detection and characterizationof the internal crystal orientation uniformity of the centimeter-level thickness workpiece in the whole thickness direction of the movement track of the centimeter-level thickness workpiece can be achieved on a production line.

Description

technical field [0001] The invention relates to non-destructive testing, in particular to a diffraction device and a method for non-destructive testing of the uniformity of crystal orientation inside a workpiece by using the diffraction device. Background technique [0002] The document "Research on the Internal Residual Stress and Grain Orientation Uniformity of Pre-stretched Thick Aluminum Plate" published by Zheng Lin et al. in the journal "Precision Forming Engineering" introduces the use of SWXRD-1000 short-wavelength X-ray diffractometer to analyze the thickness of 20mm-25mm thick aluminum plate. Non-destructive measurement of WKα along the K angle by K-angle scanning of stretched aluminum plate at different depths 1 Diffraction intensity distribution characterizing the homogeneity of the internal texture throughout the thickness of a pre-stretched aluminum sheet. However, using this short-wavelength X-ray diffractometer for detection requires scanning and measuring W...

Claims

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Application Information

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IPC IPC(8): G01N23/20G01N23/20008
CPCG01N23/20G01N23/20008G01N23/207G01N2223/056G01N2223/605G01N23/20025G01N2223/302G01N2223/602
Inventor 郑林窦世涛何长光彭正坤肖勇张伦武张津封先河
Owner NO 59 RES INST OF CHINA ORDNANCE IND
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