Color film substrate, preparation method thereof and display panel

A technology of color filter substrate and base substrate, which is applied to identification devices, instruments, diodes, etc., can solve problems such as the limitation of nozzle accuracy, the inability of quantum dot color filter substrates to meet high-resolution display requirements, and the inability to achieve display requirements, etc. To achieve the effect of improving user experience

Active Publication Date: 2020-06-09
BOE TECH GRP CO LTD
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  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] In the prior art, the quantum dot color film is usually formed on the substrate. However, in the process of forming the quantum dot color film, due to the limitation of the ultraviolet light absorption characteristics of the quantum dots, it is impossible to prepare quantum dots with a thickness of micron by photolithography. Color film layer, although micron-scale quantum dot color film layer can be prepared by inkjet printing, but due to the limitation of printer head precision and materials, the upper limit of pixel density (PPI) is about 200PPI, and higher resolution cannot be achieved display requirements for
[0004] In summary, the existing quantum dot color film substrate cannot meet the high-resolution display requirements

Method used

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  • Color film substrate, preparation method thereof and display panel
  • Color film substrate, preparation method thereof and display panel
  • Color film substrate, preparation method thereof and display panel

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Embodiment Construction

[0061] The embodiment of the application provides a color film substrate, such as figure 1 , figure 2 As shown, the color filter substrate includes: a base substrate 1 and sub-pixel regions 2 arranged in an array on the base substrate 1;

[0062] At least part of the sub-pixel area 2 includes: a light-transmitting layer 4 having a groove 3, and quantum dot microspheres 5 located in the groove 3 and corresponding to the color of light emitted from the sub-pixel area 2; the groove The width of 3 is greater than the diameter of the quantum dot microsphere 5 in the groove 3.

[0063] The color film substrate provided by the embodiment of the present application uses quantum dot microspheres as the color film layer, and the quantum dot microspheres are arranged in the groove of the light-transmitting layer, so that the size of the groove and the corresponding quantum dot microsphere can be adjusted. The diameter of the display product can change the pixel density of the display product...

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Abstract

The invention discloses a color film substrate, a preparation method thereof and a display panel, which are used for improving the resolution of a display product. The color film substrate comprises an underlayer substrate and sub-pixel areas arranged on the underlayer substrate in an array mode. At least part of the sub-pixel areas comprise light-transmitting layers with grooves and quantum dot microspheres which are located in the grooves and correspond to the light-emitting colors of the sub-pixel areas; and the width of the grooves is greater than the diameter of the quantum dot microspheres in the groove.

Description

Technical field [0001] This application relates to the field of display technology, in particular to a color filter substrate, a preparation method thereof, and a display panel. Background technique [0002] With the continuous development of display technology, people have higher and higher requirements for display quality of display devices. Quantum dot materials have the advantages of concentrated emission spectrum, high color purity, and easy adjustment of the emission color through the size, structure or composition of the quantum dot materials. In recent years, quantum dot color films have been used to enhance the color gamut of display products to improve the display effect. [0003] In the prior art, a quantum dot color film is usually formed on a base substrate. However, in the process of forming a quantum dot color film, limited by the characteristics of quantum dots to absorb ultraviolet light, it is impossible to prepare micron-thickness quantum dots by photolithograph...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02F1/1335H01L27/32G09F9/33
CPCG02F1/133514G02F1/133516G09F9/33H10K59/38
Inventor 于晶
Owner BOE TECH GRP CO LTD
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