A kind of in-situ growth nickel-based mofs film photocatalyst on the surface of foamed nickel and its preparation method and application

An in-situ growth and photocatalyst technology, applied in the field of photocatalytic materials, can solve the problems of small specific surface area of ​​semiconductor catalysts, high recombination rate of photogenerated carriers, and low degradation efficiency of VOCs, and achieve rapid photogenerated carrier separation ability, The effect of excellent adsorption capacity and good electron conductivity

Active Publication Date: 2021-08-24
GUANGDONG UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, most of the reported semiconductor photocatalysts can only show photocatalytic activity under the excitation of ultraviolet light (accounting for less than 5% of sunlight), which greatly limits their practical applications; The concentration of VOCs in the medium is low, and the specific surface area of ​​commonly used semiconductor catalysts is small, and the recombination rate of photogenerated carriers is high, resulting in low degradation efficiency of VOCs.
Up to now, there are no related studies and reports on the in-situ growth of nickel-based MOFs film photocatalysts on the surface of nickel foam and its degradation of VOCs

Method used

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  • A kind of in-situ growth nickel-based mofs film photocatalyst on the surface of foamed nickel and its preparation method and application
  • A kind of in-situ growth nickel-based mofs film photocatalyst on the surface of foamed nickel and its preparation method and application

Examples

Experimental program
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Effect test

Embodiment 1

[0030] 1. Use dilute hydrochloric acid (0.5mol / L) and deionized water to soak the ultrasonic size to 1cm 2 The foam nickel, wash away the surface stains, oxide film and organic matter of the foam nickel, so that the foam nickel reveals a fresh surface. Then, put the cleaned foamed nickel into a vacuum drying oven at 60° C. to dry to obtain surface-activated foamed nickel.

[0031] 2. Immerse the surface-activated nickel foam in a polytetrafluoroethylene reaction kettle with a molar ratio of 1:1:100 of 2-methylimidazole, methanol and sodium formate mixture, place it in an oven, set the program, 1°C / Min was raised to 120°C and kept at this temperature for 12 hours. After the reaction was completed, the temperature was lowered to room temperature to obtain an unactivated nickel-based MOFs film grown on the surface of nickel foam;

[0032] 3. After cross-washing the unactivated nickel-based MOFs film grown on the surface of nickel foam with alcohols and deionized water, put it i...

Embodiment 2

[0035] 1. Use dilute hydrochloric acid (6mol / L) and deionized water to soak the ultrasonic size to 1cm 2 The foam nickel, wash away the surface stains, oxide film and organic matter of the foam nickel, so that the foam nickel reveals a fresh surface. Then, put the cleaned foamed nickel into a vacuum oven to dry at 60° C. to obtain surface-activated foamed nickel;

[0036] 2. Immerse the surface-activated nickel foam into 2-methylimidazole, methanol and sodium formate with a molar ratio of 10:1:200, mix them into a reaction kettle with polytetrafluoroethylene, place it in an oven, set the program, 5°C / Min was raised to 100°C and kept at this temperature for 12 hours. After the reaction was completed, the temperature was lowered to room temperature to obtain an unactivated nickel-based MOFs film grown on the surface of nickel foam;

[0037] 3. After cross-washing the unactivated nickel-based MOFs film grown on the surface of nickel foam with alcohols and deionized water, put i...

Embodiment 3

[0039] 1. Use dilute hydrochloric acid (3mol / L) and deionized water to soak the ultrasonic size to 1cm 2 The foam nickel, wash away the surface stains, oxide film and organic matter of the foam nickel, so that the foam nickel reveals a fresh surface. Then, put the cleaned foamed nickel into a vacuum oven to dry at 60° C. to obtain surface-activated foamed nickel;

[0040] 2. Immerse the surface-activated nickel foam into imidazole, DMF and sodium formate with a molar ratio of 5:1:150, mix them into a reaction kettle with polytetrafluoroethylene, place it in an oven, set the program, and raise it to 180 at 10°C / min. ℃, and kept at this temperature for 4h, after the reaction was completed, the temperature was lowered to room temperature, and an unactivated nickel-based MOFs film grown on the surface of nickel foam was obtained;

[0041] 3. After cross-washing the unactivated nickel-based MOFs film grown on the surface of nickel foam with alcohols and deionized water, put it in ...

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Abstract

The invention discloses a photocatalyst for in-situ growth of nickel-based MOFs film on the surface of foamed nickel, its preparation method and application. The nickel-based MOFs film photocatalyst grown in situ on the surface of nickel foam is first placed in dilute acid, soaked in ultrasonic, then cleaned with deionized water, and dried to obtain surface-activated nickel foam; The surface-activated nickel foam is soaked in a mixture of imidazole compounds, sodium formate and solvent, and reacted at 100-180°C to obtain an unactivated nickel-based MOFs film on the surface of the foam nickel. After cooling to room temperature, take it out and soak it Activation in organic solvents, obtained by drying. The film photocatalyst synthesized in situ on the nickel foam of the present invention can not only increase the specific surface area of ​​the material, but also facilitate the adsorption and diffusion of VOCs, and have more catalytic sites exposed, so that it can be driven by sunlight Effectively degrade VOCs.

Description

technical field [0001] The invention belongs to the technical field of photocatalytic materials, and more specifically relates to a photocatalyst for in-situ growth of nickel-based MOFs film on the surface of foamed nickel and its preparation method and application. Background technique [0002] As an important source of air pollution, volatile organic compounds (VOCs) are not only important species involved in haze, photochemical pollution, and important precursors of secondary organic aerosols, but also have biological toxicity and "three effects". Become one of the three major killers of air pollution today. Therefore, how to economically and effectively purify various growing VOCs pollution problems has become an urgent problem for our government and the public to solve. Photocatalytic oxidation is an emerging VOCs treatment technology with good application prospects. It mainly uses semiconductors as photocatalysts to make O in the air 2 and H 2 O is excited to form O...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B01J31/22B01J35/06B01D53/86B01D53/02B01D53/44B01D53/72
CPCB01J31/1691B01J35/004B01J35/065B01D53/02B01D53/007B01D53/8668B01D53/8687B01D2257/704B01D2257/708B01D2259/802B01J2531/0241B01J2531/847B01J37/06B01J35/04B01J37/343B01J37/0225B01D2255/20753B01D2255/802B01D2258/0258B01J23/755B01J37/0217B01J37/0219B01J37/0236
Inventor 刘宏利丁心安太成李桂英赵惠军
Owner GUANGDONG UNIV OF TECH
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