Base and mocvd device with the base

Abstract

The present invention relates to a susceptor capable of reducing temperature variation on a support surface by coating, and an MOCVD apparatus provided with the susceptor. According to an embodiment of the present invention, the susceptor may have a support surface that supports the substrate while in contact with the substrate, and a side surface connected to the support surface, and the susceptor is configured to be inductively heated by an induction coil to heat the substrate. The substrate is heated while being supported. It may be that the base includes: a base material, made of a material capable of inductively heating in response to the induction coil; and a coating, coated on a part or all of the surface of the base material to form the supporting surface A part or all of it, and has a magnetic property different from that of the base material. According to the susceptor of the present invention and the MOCVD apparatus provided with the susceptor, by reducing the temperature unevenness on the supporting surface of the supporting substrate, it is possible to grow a thin film with more uniform characteristics on the substrate, and by using the substrate grown based on the MOCVD process, High yields can be achieved in component fabrication. In addition, according to the MOCVD apparatus of the present invention, it is possible to accurately measure the temperature on the support surface.

Description

technical field [0001] The present invention relates to a susceptor and an MOCVD apparatus provided with the susceptor, more particularly to a susceptor capable of measuring the correct temperature on the supporting surface by reducing the temperature deviation on the supporting surface by coating and having the substrate Seat MOCVD device. Background technique [0002] Chemical Vapor Deposition (CVD; Chemical Vapor Deposition) refers to a technique in which a raw material gas is flowed on a coated substrate and external energy is applied to decompose the raw material gas to form a thin film through a gas phase chemical reaction. [0003] In order to perform chemical reactions normally, various process conditions and environments need to be precisely controlled, and energy for activation needs to be supplied so that raw material gases spontaneously cause chemical reactions. [0004] Chemical vapor deposition can be divided into LPCVD (Low PressureCVD; Low Pressure Chemical ...

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Problems solved by technology

[0017] However, in the case of using a cascaded induction coil, when a cylindrical susceptor having a diameter of 100 mm or more is used due to the imbalance of the induced current inside the susceptor, there is a temperature difference in the central portion above the susceptor. The problem point that the edge part is significantly low

[0018] That is, there is a problem that the unevenness of the induced current causes temperature unevenness above the susceptor, and the temperature unevenness spreads to the temperature unevenness of the substrate placed on the susceptor supporting surface, resulting in a decrease in characteristic uniformity and production. The rate is reduced, so there is a problem of high manufacturing cost

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