Mark dot pattern and preparation method thereof

A technology of dot graphics and basic graphics, applied in the directions of copying/marking methods, manufacturing tools, welding equipment, etc., can solve the problems of cell conversion efficiency, production line capacity, equipment alarm, etc., to reduce overlapping marking, improve Productivity, damage reduction effect

Inactive Publication Date: 2020-05-05
HENGDIAN GRP DMEGC MAGNETICS CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] like figure 1 As shown, the conventional Mark dot pattern 1' in the industry is a group of concentric circles, and the laser used to make the Mark dot pattern 1' is a circular spot with a diameter of 120um. The outer diameter of the concentric circle pattern is 500um. There are 4 circles in total. During laser marking, marking will be overlapped at the junction of the two inner circles. In this way, the same position will be damaged after two laser markings. The damage is not easy to be recognized by the screen printing camera, causing the equipment to alarm , and will affect the conversion efficiency of the cell to a certain extent, seriously affecting the production line capacity

Method used

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  • Mark dot pattern and preparation method thereof
  • Mark dot pattern and preparation method thereof
  • Mark dot pattern and preparation method thereof

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Embodiment Construction

[0032] In order to make the technical problems solved by the present invention, the technical solutions adopted and the technical effects achieved more clearly, the technical solutions of the present invention are further described below with reference to the accompanying drawings and through specific embodiments.

[0033] In the description of the present invention, unless otherwise clearly specified and limited, the terms "connected", "connected" and "fixed" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integrated ; It can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediary, and it can be the internal communication of two components or the interaction relationship between two components. For those of ordinary skill in the art, the specific meanings of the above terms in the present invention can be understood in specific situat...

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Abstract

The invention belongs to the technical field of battery preparation, and discloses a Mark point pattern and a preparation method thereof. The Mark point pattern comprises a plurality of concentric circles. The outline of each circle is an imaginary line, and the imaginary and real parts of two circles adjacent to each other inside and outside are staggered and corresponding to each other. The preparation method comprises the steps of S1 drawing a base circle with a preset diameter at each of four corners of the surface of a battery piece by laser equipment according to preset coordinates; S2 performing concentric circle type filling or spiral line type filling from inside to outside on the basis of the base circle to obtain a Mark point base pattern; and S3 setting a virtual-real ratio, and selecting the Mark point basic pattern for laser marking to obtain the Mark point pattern. According to the invention, the overlapping marking phenomenon can be effectively reduced, so that the damage to the Mark point area is reduced; the Mark point pattern is easier to identify in the subsequent process; the alarm frequency is reduced; the marking time is shortened; and the productivity is improved.

Description

technical field [0001] The invention relates to the technical field of battery preparation, in particular to a Mark dot pattern and a preparation method thereof. Background technique [0002] With the development of crystalline silicon battery science and technology, PERC battery has gradually become the mainstream of the market. PERC superimposed SE technology is an effective technical path to improve battery efficiency, and it is also a technical means that is easy to implement and low in cost. , where the superimposed SE technology is realized by laser doping technology, and the laser doping pattern Mark point is a key point of the technology. [0003] In the selective emitter structure made by laser, it is necessary to print the alignment mark points of the battery during printing. Generally, four dots at fixed positions are required, which are respectively located in the four corner areas of the silicon wafer. These four mark points are Independent of each other, the l...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L31/068H01L31/18B23K26/364B41M1/12B41M1/26B41M5/00
CPCB41M1/12B41M1/26B41M5/0011B23K26/364H01L31/068H01L31/1804Y02E10/547Y02P70/50
Inventor 王建马群东蔡凯吴利军
Owner HENGDIAN GRP DMEGC MAGNETICS CO LTD
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