Preparation method of large-size nano periodic grating

Abstract

The invention discloses a preparation method of a large-size nano periodic grating. The preparation method specifically comprises the following steps: establishing an optical path system, adjusting the laser energy density, preparing a grating crack structure of a laser spot on the surface of a processed sample, and obtaining a distance d1 between two adjacent laser-induced surface periodic microstructures in a grating crack structure; moving the processing sample for multiple times along the Y direction through a three-dimensional moving platform; moving the processing sample for a set distance along the X direction through the three-dimensional moving platform, so that the structural distance d2 between the grating crack structure of the current laser spot prepared on the surface of theprocessing sample and the grating crack structure of the previous laser spot equals the structural distance d1; and repeating the steps to prepare the nano periodic grating with any length and width on the surface of the processed sample. According to the method, the large-size nano periodic grating can be directly prepared only by controlling the laser energy density and the moving platform, theprocess is simple, the requirement for the environment is extremely low, and implementation is convenient.

Description

technical field [0001] The invention relates to the technical field of optical devices, in particular to a preparation method of a large-scale nano-periodic grating. Background technique [0002] With the rapid development of human science and technology, the miniaturization and miniaturization of optical devices has developed rapidly, and the device size has gone from the traditional millimeter level to the micron or even nanometer level. As optical diffraction elements and metering elements, gratings are also used in more and more fields. In particular, gratings with periods deep down to the nanoscale play an important role in metrology optics. At present, ultraviolet lithography is generally used to prepare nano-gratings in organic and inorganic thin film materials, and electron beam etching technology can be used to prepare nano-gratings on metal materials. However, whether it is photolithography or electron beam etching technology, the preparation equipment system is ...

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Problems solved by technology

However, whether it is photolithography or electron beam etching technology, the preparation equipment system is very complicated, and the requirements for the ambient temperature and cleanliness of the grating are extremely high, and it is also accompanied by high production costs.

And for the production of large-scale gratings, traditional production methods often require complex and cumbersome processes such as grating splicing, and the grating splicing is also accompanied by problems such as low laser damage threshold

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