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Wafer Cassette Rotating Device and Cassette Rotary Lifting Equipment

A technology for rotating devices and wafers, which is applied in sustainable manufacturing/processing, climate sustainability, and final product manufacturing. It can solve problems such as uneven corrosion thickness and low corrosion efficiency, reduce concentration differences, and improve Corrosion efficiency, the effect of alleviating the unevenness of corrosion thickness

Active Publication Date: 2022-06-03
BEIJING SEMICON EQUIP INST THE 45TH RES INST OF CETC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to provide a wafer cassette rotating device and a cassette rotating and lifting mechanism to alleviate the technical problems of uneven corrosion thickness and low corrosion efficiency in the prior art wafer cassette rotating and lifting equipment

Method used

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  • Wafer Cassette Rotating Device and Cassette Rotary Lifting Equipment
  • Wafer Cassette Rotating Device and Cassette Rotary Lifting Equipment
  • Wafer Cassette Rotating Device and Cassette Rotary Lifting Equipment

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Embodiment Construction

[0039] The present invention will be described in further detail below through specific embodiments and in conjunction with the accompanying drawings.

[0051] Referring to Figure 5 and Figure 6, in the specific structure of the film box basket 3 can be provided with a basket body 31 and a cover 32, the basket of this

[0057] Preferably, the motor can be set as a servo motor to respond to the control command of the controller in time.

[0058] Specifically, referring to FIG. 6, the basket body 31 is mainly composed of two side plates 311 and a number of first support rods 312, and two

[0059] Preferably, referring to FIG. 1, a casing can be set on the outside of the driver 1, the connecting rod shaft 2, the first gear 6 and the second gear 7

[0063] To sum up, the embodiment of the present invention discloses a wafer cassette rotating device and a cassette rotating lifting device, which

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PUM

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Abstract

The invention relates to the technical field of wafer wet etching equipment, in particular to a wafer cassette rotating device and a cassette rotating and lifting mechanism. The wafer cassette rotating device includes a driver, a connecting rod shaft and a cassette basket; wherein, the driver is connected to the connecting rod shaft for driving the rotation of the connecting rod shaft; the cassette basket is fixedly connected to the connecting rod shaft, and the cassette basket is used for The film box is held and can drive the film box to rotate; the driver drives the film box basket to rotate around the axis of the connecting rod shaft through the connecting rod shaft, and the film box basket synchronously drives the film box to rotate. The cassette rotating and lifting equipment includes the above-mentioned wafer cassette rotating device. The wafer cassette rotating device and the wafer cassette rotating and lifting equipment provided by the present invention alleviate the problem of uneven corrosion thickness of wafers and improve the corrosion efficiency of wafers.

Description

Wafer cassette rotating device and cassette rotating lifting equipment technical field The present invention relates to the technical field of wafer wet etching equipment, in particular to a wafer cassette rotating device and cassette Rotary lift mechanism. Background technique Wet etching technology is a very important step in the wafer processing process, and the existing film cassette rotating and lifting equipment, It can drive the cassette containing the wafers to rotate around the vertically arranged rotating shaft to realize the translation of the cassette in the horizontal direction, and can realize Lift and lower the cassette in the vertical direction to place the cassette into different solutions in different positions. [0003] However, due to the difference in concentration of the corrosive liquid at different depths, the corrosive liquid above The concentration of the wafer is lower than the concentration of the etching liquid below, so the existing rota...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/67
CPCH01L21/67086Y02P70/50
Inventor 李元升高津平张伟锋黄鑫亮郭立刚
Owner BEIJING SEMICON EQUIP INST THE 45TH RES INST OF CETC
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