Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Substrate for preparing polyurethane screen with high temperature resistance and moisture and heat resistance

A polyurethane, moisture-resistant technology, applied in the direction of filter screen, solid separation, grid, etc., can solve the problems of poor mechanical properties, easy hydrolysis, etc.

Inactive Publication Date: 2020-02-07
太和县绿源滤材有限公司
View PDF0 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The technical problem to be solved by the present invention is to design a matrix for preparing high-temperature and heat-resistant and heat-resistant polyurethane screens, so as to solve the problems of poor mechanical properties of the existing polyurethane matrix at high temperatures and easy hydrolysis in hot and humid environments. High temperature and humidity resistant polyurethane screen

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Substrate for preparing polyurethane screen with high temperature resistance and moisture and heat resistance
  • Substrate for preparing polyurethane screen with high temperature resistance and moisture and heat resistance

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0021] A substrate for preparing high-temperature-resistant and heat-and-humidity-resistant polyurethane mesh, comprising the following steps:

[0022] (1) Preparation of dispersion: Take 4.6kg of white carbon black in parts by weight and put it into 44L of water, then add 0.4kg of sodium methylene dinaphthalene sulfonate, 0.2kg of sodium lauryl polyoxyethylene ether sulfate, 0.06kg of hydrolyzed casein and 10.5kg of glass microspheres were then stirred at a speed of 3000r / min for 1.5h and then adjusted to a pH value of 10h with 0.2mol / L NaOH solution to obtain a dispersion for subsequent use;

[0023] (2) Preparation of latex mixture: use deionized water to prepare a 100kg latex with a solid content of 40% from natural latex, stir at a speed of 180r / min for 10min, add 42L of the dispersion prepared in step (1), After stirring evenly, add 26L of glacial acetic acid solution with a mass concentration of 8%, and the temperature when the glacial acetic acid solution is added to t...

Embodiment 2

[0028] A polyurethane sieve plate for impact-resistant ore screening, comprising the following steps:

[0029] A substrate for preparing high-temperature-resistant and heat-and-humidity-resistant polyurethane mesh, comprising the following steps:

[0030] (1) Preparation of the dispersion: Take 5.0 kg of white carbon black in 42 L of water, then add 0.5 kg of sodium methylene dinaphthalene sulfonate, 0.3 kg of sodium lauryl polyoxyethylene ether sulfate, 0.08kg of hydrolyzed casein and 12kg of glass microspheres, then stirred at a speed of 3200r / min for 2h and adjusted to a pH value of 10h with 0.2mol / L NaOH solution to obtain a dispersion for subsequent use;

[0031] (2) Preparation of latex mixture: use deionized water to prepare a 100kg latex with a solid content of 40% from natural latex, stir at a speed of 180r / min for 10min, add 42L of the dispersion prepared in step (1), After stirring evenly, add 26L of glacial acetic acid solution with a mass concentration of 10%, an...

Embodiment 3

[0036] A substrate for preparing high-temperature-resistant and heat-and-humidity-resistant polyurethane mesh, comprising the following steps:

[0037] (1) Preparation of dispersion: Take 4.6kg of white carbon black in parts by weight and put it into 44L of water, then add 0.4kg of sodium methylene dinaphthalene sulfonate, 0.2kg of sodium lauryl polyoxyethylene ether sulfate, 0.06kg of hydrolyzed casein and 10.5kg of glass microspheres were then stirred at a speed of 3000r / min for 1.5h and then adjusted to a pH value of 10h with 0.2mol / L NaOH solution to obtain a dispersion for subsequent use;

[0038] (2) Preparation of latex mixture: use deionized water to prepare a 100kg latex with a solid content of 45% from natural latex, stir at a speed of 160r / min for 10min, add 42L of the dispersion prepared in step (1), After stirring evenly, add 26L of glacial acetic acid solution with a mass concentration of 10%, and the temperature of the glacial acetic acid solution when it is add...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Heat distortion temperatureaaaaaaaaaa
Login to View More

Abstract

The invention relates to the technical field of polyurethane screens and in particular relates to a substrate for preparing a polyurethane screen with high temperature resistance and moisture and heatresistance. The substrate comprises four main preparation steps of preparation of a dispersion liquid, preparation of a latex mixed liquid, preparation of a composite filler and preparation of a polyurethane substrate. According to the substrate, the composite filler is prepared by using a latex coprecipitation method, moisture in the polyurethane substrate can be effectively absorbed through thehydrophilcity of latex in the filler and is prevented from diffusion, and meanwhile, through the reinforcing function of black carbon white and glass beads, the black carbon white and the glass beadsare modified and mixed with the latex to form the composite filler which is dispersed into polyurethane, so that large internal heat generated inside the polyurethane under a dynamic condition can beeffectively reduced, and properties of high temperature resistance and moisture and heat resistance of the polyurethane can be improved.

Description

technical field [0001] The invention relates to the technical field of polyurethane screens, in particular to a substrate for preparing high-temperature-resistant, damp-heat-resistant polyurethane screens. Background technique [0002] In metallurgy, coal, chemical and many other industries, materials such as washing, screening, grading, deslagging, desliming, dehydration and other processes need to be screened by vibrating screens. The screens used in the screening are mainly metal screens and Polyurethane screen, and polyurethane screen has many advantages such as long service life, large bearing capacity, high screening efficiency, low noise, low energy consumption, and wide application range, gradually replacing metal screen surface, but polyurethane screen also has fatal The disadvantages make it impossible to replace the metal sieve plate in some fields. Among them, polyurethane generates large internal heat under dynamic conditions, and the heat resistance of polyure...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C08L75/06C08L7/02C08K13/06C08K9/04C08K7/26C08K7/20C08K5/098C08G18/76C08G18/42B29B9/06B07B1/46
CPCB07B1/4618B29B9/06C08G18/42C08G18/7614C08K2201/003C08L75/06C08L2205/03C08L7/02C08K13/06C08K9/04C08K9/08C08K7/26C08K7/20C08K5/098
Inventor 高俊礼
Owner 太和县绿源滤材有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com