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Substrate cleaning device

A technology for cleaning devices and substrates, applied in the direction of electrostatic cleaning, cleaning methods and utensils, cleaning methods using gas flow, etc., can solve problems such as long paths, improve quality and efficiency, prevent dust particles from scattering, and save The effect of manpower and material resources

Inactive Publication Date: 2019-12-17
WUHAN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0010] The above method of cleaning the substrate uses a large amount of water to clean the substrate. The substrate cleaning path is long, and there are often some particles on the surface of the substrate after cleaning, such as debris, dust, foreign matter, etc. that are strongly adsorbed by static electricity.

Method used

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Embodiment Construction

[0034] In order to further illustrate the technical means and effects adopted by the present invention, the following describes in detail in conjunction with the embodiments of the present invention and the accompanying drawings.

[0035] see figure 1 , the present invention provides a substrate cleaning device, including a conveyor belt 1 for transporting a substrate 9, a cleaning system 2 for cleaning the substrate 9 on the conveyor belt 1, and a device for collecting particles removed from the substrate 9. Dust collection system 3 , grating sensor 4 for detecting whether substrate 9 enters cleaning system 2 , and electrical box 5 electrically connected to cleaning system 2 , dust collection system 3 , and grating sensor 4 .

[0036] Specifically, the cleaning system 2 includes a cleaning frame 21 that is located above the conveyor belt 1 and defines a cleaning space above the conveyor belt 1 , and rollers that are sequentially arranged above the conveyor belt 1 in the clean...

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Abstract

The invention discloses a substrate cleaning device. The substrate cleaning device comprises a transfer substrate, a cleaning system and a dust collection system, the cleaning system comprises a cleaning rack located above a conveyor belt and a cleaning spraying head located in the cleaning rack, the cleaning spraying head is a rotary spraying head , the cleaning spraying head sprays a high-speedrotating electrostatic air flow during using, dust particles on the substrate surface are effectively raised, then the dust collection system expels air containing the dust particles out of the cleaning system through negative pressure, the whole cleaning process is conducted in the closed cleaning system, the dust particles can be effectively prevented from dispersing, and the dust particles adsorbed on the substrate surface by electrostatic force can also be effectively blown away to achieve the cleaning effect. The substrate cleaning device is used for cleaning a substrate before any operation, the production quality hazard caused by particle pollution can be effectively avoided, a great deal of manpower and a large number of material resources can be saved, and the production quality and the production efficiency are improved.

Description

technical field [0001] The invention relates to the field of display screen manufacturing, in particular to a substrate cleaning device. Background technique [0002] In the field of display technology, flat-panel displays such as Liquid Crystal Display (LCD) and Organic Light Emitting Diode (OLED) have gradually replaced CRT displays, and are widely used in LCD TVs, mobile phones, personal digital assistants, digital Cameras, computer or laptop screens, etc. [0003] The display panel is an important part of LCD and OLED display devices. Whether it is an LCD display panel or an OLED display panel, it usually has two glass substrates, an upper and a lower one. Taking the LCD display panel as an example, it is mainly composed of a TFT array substrate, a color filter substrate (Color Filter, CF), and a liquid crystal layer (Liquid Crystal Layer) arranged between the two substrates. Its working principle is through A driving voltage is applied to the TFT array substrate and ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B08B5/02B08B6/00B08B15/04H01L21/67B01D46/00
CPCB01D46/00B08B5/023B08B6/00B08B15/04H01L21/67017
Inventor 陈建锋
Owner WUHAN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
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