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Automatic cleaning device for quartz wafers

An automatic cleaning, quartz wafer technology, applied in the directions of drying gas arrangement, cleaning methods and utensils, cleaning methods using liquids, etc., can solve the problems of no air-drying function and low cleaning efficiency, avoiding the backflow of dirt and improving cleaning. The effect of efficiency

Inactive Publication Date: 2019-11-22
马鞍山荣泰科技有限公司
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] Aiming at the deficiencies of the prior art, the present invention provides an automatic cleaning device for quartz wafers, which solves the problems that the existing equipment does not have the air-drying function and the cleaning efficiency is low

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  • Automatic cleaning device for quartz wafers
  • Automatic cleaning device for quartz wafers
  • Automatic cleaning device for quartz wafers

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Embodiment Construction

[0023] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0024] see Figure 1-3 As shown, a kind of embodiment that the present invention provides: a kind of quartz wafer automatic cleaning device, comprises shell 1, and the bottom of shell 1 is equipped with support leg 18, and the surface of shell 1 is equipped with PLC controller 19, and PLC control The model of the device 19 is S7-400, which is the prior art. The inside of the housing 1 is provided with a cleaning tank 2, and the inside of the housing 1 directly...

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Abstract

The invention discloses an automatic cleaning device for quartz wafers. The automatic cleaning device comprises a shell, wherein the bottom of the cleaning tank is connected with a filtering tank through a drainage pipeline, a filter screen plate is arranged in a filter tank, limiting blocks are symmetrically arranged on the side wall inside the cleaning tank, a first pipeline is arranged inside amounting groove, spray heads are uniformly arranged on the surface of the first pipeline at equal intervals, an air blower is installed inside the shell, the output end of the blower is connected with the first pipeline through a second pipeline, a circulating pump is installed inside the shell, a water pump is installed inside the water tank, an ultrasonic generator is connected with an ultrasonic transducer, and the output end of the ultrasonic transducer is connected with one side of the cleaning tank. According to the automatic cleaning device, by arranging the first pipeline, the limiting blocks, the spray heads, the second pipeline, the air blower, the water pump, the circulating pump and the filter screen plate structure, the problems of no air drying function and low cleaning efficiency of existing equipment are solved.

Description

technical field [0001] The invention relates to the technical field of quartz wafer cleaning, in particular to an automatic cleaning device for quartz wafers. Background technique [0002] Quartz sheet is usually smelted and cut and ground from quartz, and its silica content can reach more than 99.99%. The hardness is Mohs seven, and it has the characteristics of high temperature resistance, low thermal expansion coefficient, thermal shock resistance and good electrical insulation performance. It is usually colorless and transparent, with a visible light transmittance of more than 85%. However, during the production and processing of quartz wafers, dirt such as dust will stick to the surface, which will affect the quality of quartz wafers. Therefore, it needs to be cleaned. However, the existing Quartz wafers overlap each other during the cleaning process, thereby affecting cleaning efficiency. [0003] But there are following deficiencies in existing technology: [0004]...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B08B3/12B08B3/14B08B3/08F26B21/00
CPCB08B3/08B08B3/12B08B3/14F26B21/004
Inventor 李直荣温从众李直权
Owner 马鞍山荣泰科技有限公司
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