Color filter developing solution composition

A color filter and composition technology, applied in the field of microelectronic materials, can solve the problems of frequent customer purchases, low developer concentration, narrow operating range, etc., to reduce transportation and production costs, clear developing patterns, and large operating windows Effect

Inactive Publication Date: 2019-11-19
华璞微电子科技(宁波)有限公司
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Due to the large amount of color filter developer, usually the color filter developer is a high-concentration solution. In addition to the performance shortcomings of the above-mentioned patent developer, such as more foam, narrow operating range, and residue after development, there are also developing Disadvantages such as low liquid concentration, frequent customer purchases, and high cost

Method used

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  • Color filter developing solution composition
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  • Color filter developing solution composition

Examples

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Embodiment Construction

[0031] Below in conjunction with accompanying drawing and specific embodiment the present invention is described in detail:

[0032] Ten embodiments and three comparative examples are provided below, and their respective components used and the consumption of each component are as shown in Table 1 below:

[0033] The consumption of each component of table 1 embodiment 1-10 and comparative example 1-3

[0034]

[0035]

[0036] As can be seen from the contents in Table 1 above, the difference between Comparative Example 1 and Example 10 is that Comparative Example 1 removed the nonionic Gemini surfactant and solubilizer, and used high-purity water to supplement the nonionic Gemini surfactant and The quality of the solubilizer. The difference between Comparative Example 2 and Example 10 is that the solubilizer is removed in Comparative Example 2, and the quality of the solubilizer is supplemented with high-purity water. The difference between Comparative Example 3 and Ex...

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Abstract

The invention discloses a color filter developing solution composition and belongs to the field of microelectronic material technology. The composition comprises, by weight, 1-45% of non-ionic Geminisurfactant, 0.1 to 30% of a strongly alkaline substance, 0.1 to 50% of a solubilizer, and 20-98% of high purity water. A concentration of the developing solution is 2.5 times that of a current marketproduct. At the same time, the developing solution has characteristics of high dispersion stability, less foam, a large operating window, a clear pattern after development, a good photoresist residueprevention effect, and a good substrate corrosion prevention effect and so on.

Description

technical field [0001] The invention belongs to the technical field of microelectronic materials, and relates to a composition, in particular to a color filter developing solution composition, which is suitable for negative reactions in the color filter (Color filter) manufacturing process of a liquid crystal display (TFT-LCD). Type photoresist development. Background technique [0002] Generally, the manufacturing process of a liquid crystal display (TFT-LCD) includes four parts: an array segment (Array), a color filter (Color filter), a box (Cell) and a module (Module). Among them, the production of the color filter is to make red (Red), green (Green), blue (Blue) three primary color organic materials in each pixel on the glass substrate. At present, the most popular mass production method is the pigment dispersed method (Pigment dispersed method), wherein pigment dispersed color photoresist (pigment Dispersed Color Resist, PDCR) is the raw material for forming the color ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/32
CPCG03F7/322
Inventor 刘江华付元涛章小琴
Owner 华璞微电子科技(宁波)有限公司
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