Cycloolefin copolymer micro-lens array with metal diaphragm and preparation method thereof

A technology of cycloolefin copolymer and microlens array, which is applied in the direction of lens, optomechanical equipment, photoplate making process of pattern surface, etc. It can solve the difficult problem of optical microlens dimensional accuracy and shape, and the complex processing and integration of matching aperture , high processing costs and other issues, to achieve good array uniformity and repeatability, cost and time saving, and short processing time

Active Publication Date: 2019-11-08
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

This patented technique involves creating tiny holes or other structures within an optical material by melting it into liquid at room temperature before being pressed onto another solid plate called glass slide that helps cool down any remaining solvent during manufacturing. By doing this, these techniques simplify the production processes while maintaining their effectiveness over longer periods. Additionally, they use various technical means such as heat presses, compression force, gravitational forces, magnetic fields, etc., to improve the quality of the final product. Overall, this new approach simplifies the way we prepare micro-lenses arrays (MLAs) quickly and efficiently compared to traditional ways like casting them out from cathode ray tubes).

Problems solved by technology

This patents describes various technical means that have been developed during recent years for creating miniature plasma display systems called LCOS displays or MOSFETLMS displays. These devices use tiny mirror elements like silicon dioxy ceramic microspheres or polysiloxane to control their reflection characteristics. They require precise placement within specific areas where they work properly without being affected by external factors such as temperature changes or other environmental influences. Additionally, these components must be integrated together efficiently at large scales due to increasing demand over time. Current fabricating technologies involve multiple steps involving etching, deposition, machining, thermal compression bonding, injection moldings, and others requiring significant investments and equipment expenditure.

Method used

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[0048] The invention provides a cycloolefin copolymer microlens array with a metal diaphragm and a preparation method thereof.

[0049] In a first aspect, the present invention provides a cycloolefin copolymer microlens array with a metal diaphragm, comprising the steps of:

[0050] S101, using the first photolithography mask to form a first photoresist mask with a microlens array pattern on the surface of the silicon wafer substrate by photolithography;

[0051] S102, using an etching method to etch the first photoresist mask to etch a silicon wafer microhole array on the silicon wafer substrate;

[0052] S103. After paving the cycloolefin copolymer layer on the micropore array of the silicon chip, heat and press, cool, separate the micropore array of the silicon chip from the cycloolefin copolymer layer, and invert the cycloolefin copolymer layer to obtain the first cycloolefin copolymer arrays;

[0053] S104. Using a second photolithography mask to form a second photoresi...

Embodiment 1

[0070] The method for preparing the cycloolefin copolymer microlens array with metal diaphragm provided by the present invention may specifically comprise the following steps:

[0071] (1) Spin-coat positive photoresist on the surface of the silicon wafer substrate, use the first photolithography mask to expose and develop, and form a patterned first photoresist mask on the surface of the silicon wafer substrate, the first photolithography The patterns on the glue mask are photoresist microlens array patterns.

[0072] (2) by dry etching the silicon wafer substrate with the first photoresist mask, form the same diameter with the photoresist microlens array pattern diameter on the silicon wafer substrate with the first photoresist mask Microhole arrays on silicon wafers, and passivation treatment on the surface of microhole arrays on silicon wafers.

[0073] (3) Put the cycloolefin copolymer and the passivated silicon wafer micropore array into a hot press, place a spacer ring...

Embodiment 2

[0080] The method for preparing the cycloolefin copolymer microlens array with metal diaphragm provided by the present invention may specifically comprise the following steps:

[0081] (1) Spin-coat positive photoresist on the surface of the silicon wafer substrate, use the first photolithography mask to expose and develop, and form a patterned first photoresist mask on the surface of the silicon wafer substrate, the first photolithography The patterns on the glue mask are photoresist microlens array patterns.

[0082] (2) by dry etching the silicon wafer substrate with the first photoresist mask, form a diameter identical to the photoresist microlens array pattern diameter on the silicon wafer substrate with the first photoresist mask Microhole arrays on silicon wafers, and passivation treatment on the surface of microhole arrays on silicon wafers.

[0083] (3) Put the cycloolefin copolymer and the passivated silicon chip micropore array into a hot press, place a spacer ring...

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Abstract

The invention discloses a cycloolefin copolymer micro-lens array with a metal diaphragm and a preparation method thereof. The preparation method comprises the following steps of step S101, forming a first photoresist mask on the surface of a silicon wafer substrate by adopting a photolithography method and using a first photolithographic mask; step S102, etching a silicon wafer micropore array onthe silicon wafer substrate; step S103, paving a cycloolefin copolymer layer on the silicon wafer micropore array, and then carrying out hot-pressing treatment to obtain a first cycloolefin copolymerarray; step S104, forming a second photoresist mask on the cycloolefin copolymer array by adopting a reverse-phase photolithography method and using a second photolithographic mask to obtain a secondcycloolefin copolymer array; step S105, evaporating a layer of metal on a structural surface of the second cycloolefin copolymer array to obtain a third cycloolefin copolymer array; and step S106, putting the third cycloolefin copolymer array into acetone liquid to obtain the cycloolefin copolymer micro-lens array with the metal diaphragm.

Description

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Claims

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Application Information

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Owner CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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