Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A kind of graphene mask cloth and preparation method thereof

A graphene surface, olefin mask technology, applied in chemical instruments and methods, pharmaceutical formulations, rayon manufacturing and other directions, can solve the problems of poor bacteriostatic effect, dust, weak adsorption capacity of cosmetics, etc., to reduce blocking and promote cross-linking. , Improve the effect of microcirculation

Active Publication Date: 2021-05-28
杭州恒邦实业有限公司
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The purpose of the present invention is: in order to solve the problem that the current common facial mask base cloth often adopts non-woven fabrics and bamboo charcoal materials, has weak adsorption capacity for dust and cosmetics left on the face, and has poor antibacterial effect, and proposes a graphene facial mask cloth and its preparation method

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A kind of graphene mask cloth and preparation method thereof
  • A kind of graphene mask cloth and preparation method thereof
  • A kind of graphene mask cloth and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0039] A kind of preparation method of graphene mask cloth, comprises the steps:

[0040] (1) Take corncobs and grind them through a 100-mesh sieve in a grinder, collect the sieved matter and add a sodium carbonate solution with a mass fraction of 12% at a mass ratio of 1:6-10, and stir at 30-45°C at 400-700r / min Mix for 30 to 55 minutes, filter, take the filter cake and wash it with water for 2 to 4 times, take the filter cake and add HCl solution with a mass fraction of 15% according to the mass ratio of 1:7 to 12, mix and stir for 30 to 50 minutes, filter with suction, collect the filter residue in a microwave oven Treat with 400W power for 4-7 minutes to get the processed product. In terms of parts by mass, take 20-30 parts of processed product and 1-3 parts of FeCl 2 , 1 to 3 parts of FeCl 3, 2 to 5 parts of potassium chloride, 150 to 200 parts of water are mixed in a reactor, stirred at 40 to 55 °C at 350 to 550 r / min for 1 to 3 hours, and then ultrasonically treated at...

Embodiment 1

[0050] A kind of preparation method of graphene mask cloth, comprises the steps:

[0051] (1) Take corncobs and grind them through a 100-mesh sieve in a pulverizer, collect the sieved matter and add a sodium carbonate solution with a mass fraction of 12% at a mass ratio of 1:6, stir and mix at 30°C at 400r / min for 30min, filter, and take Wash the filter cake twice with water, take the filter cake and add HCl solution with a mass fraction of 15% according to the mass ratio of 1:7, mix and stir for 30 minutes, filter with suction, collect the filter residue and treat it in a microwave oven with a power of 400W for 4 minutes to obtain the processed product, calculated in parts by mass , take 20 parts of treatment, 1 part of FeCl 2 , 1 part of FeCl 3 , 2 parts of potassium chloride, and 150 parts of water were mixed in a reactor, stirred at 40° C. at 350 r / min for 1 hour, and then ultrasonically treated at a frequency of 45 kHz for 12 minutes to obtain an ultrasonically treated m...

Embodiment 2

[0061] A kind of preparation method of graphene mask cloth, comprises the steps:

[0062] (1) Take corncobs and grind them through a 100-mesh sieve in a pulverizer, collect the sieved matter and add a sodium carbonate solution with a mass fraction of 12% at a mass ratio of 1:10, stir and mix at 45°C at 700r / min for 55min, filter, and take Wash the filter cake with water for 4 times, take the filter cake and add HCl solution with a mass fraction of 15% according to the mass ratio of 1:12, mix and stir for 50 minutes, filter with suction, collect the filter residue and treat it in a microwave oven with a power of 400W for 7 minutes to obtain the treated product, calculated in parts by mass , take 30 parts of treatment, 3 parts of FeCl 2 , 3 parts FeCl 3 , 5 parts of potassium chloride, and 200 parts of water were mixed in a reactor, stirred at 55° C. for 3 hours at 550 r / min, and then ultrasonically treated at a frequency of 55 kHz for 20 minutes to obtain an ultrasonically tre...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

The invention discloses a graphene mask cloth and a preparation method thereof, belonging to the technical field of mask base cloth. The biomass graphene mask cloth made by the present invention comprises an inner layer, a middle layer and an outer layer, the inner layer is a liquid storage layer, the middle layer is a graphene fiber layer, and the outer layer is an anti-seepage layer. The present invention uses natural corncobs as raw materials, The graphene fiber layer with rich porous structure and super adsorption force is prepared by group coordination assembly carbon analysis method, and the anti-seepage layer is composed of chitin fiber and polylactic acid. The invention solves the problems that the current facial mask base cloth has weak adsorption ability to residual dust and cosmetics on the face and poor antibacterial effect.

Description

technical field [0001] The invention belongs to the technical field of facial mask base cloth, and in particular relates to a graphene facial mask cloth and a preparation method thereof. Background technique [0002] At present, mask is an indispensable skin care and beauty product in people's life. It can temporarily isolate the face from external air pollution, promote the expansion of skin pores, increase the oxygen content of the skin, and allow the moisture and other beneficial ingredients in the mask to penetrate into the skin. The stratum corneum makes the skin moist and elastic. As the carrier of this process, the facial mask base fabric itself has been paid more and more attention to the functionality of the skin. However, most of the current facial mask base cloths are only used as essence carriers, ignoring their functionality. Plant fiber as a mask base fabric is a research hotspot in the field of cosmetics recently. Plant fiber has high compliance and air perm...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): B32B9/00B32B9/04B32B27/02B32B27/30B32B27/36B32B33/00B32B37/06B32B37/10B32B38/00D01F9/12D01F8/10D01F8/14D01F8/18D01F1/10A61K8/02A61Q19/00
CPCA61K8/0212A61Q19/00B32B5/022B32B5/26B32B33/00B32B37/06B32B37/10B32B38/00B32B2262/106B32B2307/7145B32B2307/7265D01F1/10D01F8/10D01F8/14D01F8/18D01F9/12
Inventor 徐波
Owner 杭州恒邦实业有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com