Cutting adhesive tape for wafer processing and preparation method thereof
A technology for cutting tapes and wafers, which is applied in adhesives, semiconductor/solid-state device manufacturing, electrical components, etc. It can solve the problems of easy peeling, low initial adhesion and peel strength, and easy peeling of pressure-sensitive agents to achieve peel strength. The effect of low and excellent pickup performance
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Embodiment 1
[0042] Embodiment 1 of the present invention provides a dicing tape for wafer processing, including a substrate layer and an adhesive layer;
[0043] The raw materials for the preparation of the adhesive layer include 95 parts of olefinic acid, 5 parts of crosslinking agent and 50 parts of polyurethane;
[0044] The raw materials for the preparation of the adhesive layer also include a photopolymerization initiator, and the ratio of the photopolymerization initiator to the olefinic acid substance is 0.045:1;
[0045] Alkenoic acids include methacrylic acid, 3-hydroxyoct-7-enoic acid and 5-(3,4-dihydroxyphenyl)-2,4-pentadienoic acid, methacrylic acid, 3-hydroxyoct-7- The weight ratio of 7-enoic acid and 5-(3,4-dihydroxyphenyl)-2,4-pentadienoic acid is 5:2.5:1;
[0046] The crosslinking agent is 1,3-phenylene diisocyanate;
[0047] The raw materials for the preparation of polyurethane include polyisocyanate, catalyst, and small molecule polyol, and the weight ratio of polyisoc...
Embodiment 2
[0057] Embodiment 2 of the present invention provides a dicing tape for wafer processing, including a substrate layer and an adhesive layer;
[0058] The raw materials for the preparation of the adhesive layer include 100 parts of alkene, 10 parts of crosslinking agent and 65 parts of polyurethane;
[0059] The raw materials for the preparation of the adhesive layer also include a photopolymerization initiator, and the ratio of the photopolymerization initiator to the olefinic acid is 0.1:1;
[0060] Alkenoic acids include methacrylic acid, 3-hydroxyoct-7-enoic acid and 5-(3,4-dihydroxyphenyl)-2,4-pentadienoic acid, methacrylic acid, 3-hydroxyoct-7- The weight ratio of 7-enoic acid and 5-(3,4-dihydroxyphenyl)-2,4-pentadienoic acid is 6.5:3.5:1;
[0061] The crosslinking agent is 1,3-phenylene diisocyanate;
[0062] The raw materials for the preparation of polyurethane include polyisocyanate, catalyst, and small molecule polyol, and the weight ratio of polyisocyanate, catalys...
Embodiment 3
[0072] Embodiment 3 of the present invention provides a dicing tape for wafer processing, including a substrate layer and an adhesive layer;
[0073] The raw materials for the preparation of the adhesive layer include 80 parts of alkene, 0.1 part of a crosslinking agent and 35 parts of polyurethane;
[0074] The raw materials for the preparation of the adhesive layer also include a photopolymerization initiator, and the ratio of the photopolymerization initiator to the olefinic acid is 0.01:1;
[0075] Alkenoic acids include methacrylic acid, 3-hydroxyoct-7-enoic acid and 5-(3,4-dihydroxyphenyl)-2,4-pentadienoic acid, methacrylic acid, 3-hydroxyoct-7- The weight ratio of 7-enoic acid and 5-(3,4-dihydroxyphenyl)-2,4-pentadienoic acid is 3.5:1.5:1;
[0076] The crosslinking agent is 1,3-phenylene diisocyanate;
[0077] The raw materials for the preparation of polyurethane include polyisocyanate, catalyst, and small molecule polyol, and the weight ratio of polyisocyanate, catal...
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