Method for preparing patterned graphene temperature sensor through lasers
A temperature sensor and graphene technology, applied in the field of nano-sensors, can solve the problem of rarely reported temperature sensing, and achieve the effect of safety in the preparation process
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[0028] In order to solve the technical problems existing in the background technology, the present invention provides a method for preparing a patterned graphene gas sensor, that is, using an ultrashort pulse laser to pattern the complete graphene so that it has a specific topological structure, each Each topological structure has a specific defect type and density to achieve the purpose of controllable defect introduction, thereby controllably reducing the thermal conductivity of graphene, so that a small change in temperature can produce a large resistance change, and then perform sensing.
[0029] A kind of method utilizing laser to prepare patterned graphene temperature sensor provided by the invention comprises the following steps:
[0030] Step 1. Put the copper foil sample loaded with graphene into the corrosion solution to etch the copper foil. After the copper in the sample is completely etched, transfer the graphene to deionized water and soak for 30 minutes. Repeat t...
Embodiment 1
[0042] The graphene on polydimethylsiloxane (PDMS) was square-etched by picosecond laser, and the temperature sensing performance of patterned graphene was detected.
[0043] The preparation steps are as follows:
[0044] (1) Preparation of transparent substrate PDMS
[0045] Mix DC184 and curing agent in a ratio of 10:1, stir well to generate air bubbles, put it into an ultrasonic cleaning instrument until the air bubbles completely disappear, pour it into a mold (150mm*150mm*10mm), and place it in an oven at 80°C for 2 hours to cure .
[0046] (2) Graphene transfer
[0047] Prepare FeCl with a concentration of 0.5mol / L 3 / HCl solution is used to etch copper, and the graphene / copper foil with an area of 10mm*10mm is cut and placed on the surface of the etching solution. After etching for 2 to 4 hours, transfer the graphene to deionized water with filter paper, soak for 30 minutes, then transfer to new deionized water, soak for 30 minutes, and transfer to the PDMS substra...
Embodiment 2
[0053] The graphene on polydimethylsiloxane (PDMS) was square-etched by femtosecond laser, and the temperature sensing performance of the patterned graphene sample was detected.
[0054] The preparation steps are as follows:
[0055] (1) Preparation of transparent substrate PDMS
[0056] Mix DC184 and curing agent in a ratio of 10:1, stir well to generate air bubbles, put it into an ultrasonic cleaning instrument until the air bubbles completely disappear, pour it into a mold (150mm*150mm*10mm), and place it in an oven at 80°C for 2 hours to cure .
[0057] (2) Graphene transfer
[0058] Prepare FeCl with a concentration of 0.5mol / l 3 / HCl solution is used to etch copper, and the graphene / copper foil with an area of 10mm*10mm is cut and placed on the surface of the etching solution. After etching for 2 to 4 hours, transfer the graphene to deionized water with filter paper, soak for 30 minutes, then transfer to new deionized water, soak for 30 minutes, and transfer to the...
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