Laser annealing device

Abstract

The embodiment of the invention discloses a laser annealing device which comprises a control module, a laser beam generation module, a laser beam adjustment module and an optical module. The laser beam generation module is electrically connected with the control module and is used for producing a first laser beam according to a laser control signal output by the control module; the laser beam adjustment module is electrically connected with the control module and is used for adjusting the laser intensity distribution of the first laser beam so as to convert into a second laser beam according to a movable mechanism parameter output by the control module; and the optical module is used for converging the second laser beam so as to form a light spot corresponding to the laser control signal on a correspondingly arranged substrate. According to the laser annealing device provided by the embodiment of the invention, no matter how the quality of a light beam output by the laser changes, thefirst laser beam cannot be influenced, and uncertain influences cannot bring to the process; and the yield of the laser has no need to be frequently adjusted, so that the maximum utilization of the yield of the laser is ensured.

Description

technical field [0001] Embodiments of the present invention relate to laser technology, and in particular to a laser annealing device. Background technique [0002] Annealing mainly refers to the heat treatment process in which the material is exposed to high temperature for a long time and then cooled slowly. Traditional furnace heating annealing, even at temperatures as high as 1100 degrees, still cannot completely eliminate crystal defects. Laser annealing can eliminate crystal defects more thoroughly. [0003] Existing laser annealing technology, when the silicon wafer requires high-energy exposure, generates a small-sized spot by actively increasing the laser light intensity to achieve strong energy; when the silicon wafer requires low-energy exposure, it actively reduces the laser light intensity. A large spot size is generated to achieve weak energy, and the size of the small spot size and the large spot size are fixed. However, the productivity of the laser is rel...

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Problems solved by technology

[0004] The embodiment of the present invention provides a laser annealing device to solve the problem that the maximum productivity of the laser cannot be exerted

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