Preparation method of cylinder photosensitive resist

A technology of photosensitive glue and rotary screen, applied in the field of photosensitive glue, can solve the problems such as the consumption of rotary screen, seriousness, difficult to peel off the resin, etc., and achieve the effect of saving cost, reducing the number of hydroxyl groups, and reducing the dosage

Active Publication Date: 2019-07-26
绍兴市嘉诚感光材料有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] However, the resin screen formed on the rotary screen is usually hard to peel off the resin on the screen after it is set.
When it is necessary to switch to a different pattern, it is necessary to use a new rotary screen for plate making, and the consumption of the rotary screen is relatively serious

Method used

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  • Preparation method of cylinder photosensitive resist
  • Preparation method of cylinder photosensitive resist
  • Preparation method of cylinder photosensitive resist

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0061] refer to figure 1 , the preparation method of a kind of rotary screen photosensitive adhesive disclosed by the present invention, comprises the following steps:

[0062] S1: Coating a layer of isolation layer on the surface of the cylinder;

[0063] Step (1): Grinding filler raw materials into powder in proportion, and mixing evenly;

[0064] Step (2): coating a layer of adhesive on the surface of the cylinder;

[0065] Step (3): coating the filler powder in step (1) on the surface of the adhesive to form a filler layer, and the thickness of the filler layer is controlled at 2mm;

[0066] Step (4): Press the filler layer on the cylinder until the adhesive solidifies;

[0067] Wherein, filler comprises the component of following percentage by weight:

[0068]

[0069] S2: step (1) prepare photosensitive glue raw material, its each component weight percent is as follows:

[0070]

[0071] Wherein, epoxy resin curing agent comprises the component of following we...

Embodiment 1

[0095] The difference between Examples 11-14 and Example 1 is that each component in the photosensitive adhesive raw material is calculated in the following table by weight percentage.

[0096]

[0097]

[0098] The difference between Examples 15-18 and Example 1 is that each component in the epoxy resin curing agent is calculated in the following table by weight percentage.

[0099]

[0100] The difference between Examples 19-22 and Example 1 is that each component in the polyvinyl alcohol modifier is listed in the following table by weight percentage.

[0101]

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Abstract

The invention discloses a preparation method of cylinder photosensitive resist, and relates to the technical field of photosensitive resist preparation. The preparation method comprises the followingsteps of S1, coating an isolation layer on the surface of a cylinder; S2, proportionally mixing and uniformly stirring raw materials of the photosensitive resist to obtain a photosensitive resist stock solution; S3, coating the photosensitive resist stock solution on the surface of the cylinder; S4, bonding a patterned film with a side wall of the cylinder after the photosensitive resist stock solution in Step S3 is dried; S5, performing pattern exposure on the cylinder bound with the film in Step S4; S6, removing the film on the exposed cylinder and then washing the cylinder with water; S7, performing high-temperature shaping on the cylinder after the water in Step S6 is dried; and S8, obtaining a required cylinder photosensitive resist forme after the cylinder shaping in Step S7 is completed. The preparation method has an effect of quickly and conveniently stripping a photosensitive resist layer.

Description

technical field [0001] The invention relates to the technical field of photosensitive glue, in particular to a preparation method of a rotary screen photosensitive glue. Background technique [0002] The main components of water-emulsion rotary screen photosensitive adhesives currently on the market are dichromate and polyvinyl alcohol systems as photosensitive systems. When in use, the photosensitizer aqueous solution composed of the above photosensitive system is first mixed into the photosensitive glue, and then the glue layer is coated on the circular net. After drying, a photosensitive film is formed, and then the corresponding film sheet with a pattern pattern is attached to the photosensitive film for exposure. After exposure, the photosensitive adhesive blocked by the film sheet did not react, but in the part that received the light, the chromium ions in the photosensitive film reacted photochemically with the hydroxyl groups in the polyvinyl alcohol to form a water...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/09G03F7/16G03F7/40
CPCG03F7/092G03F7/168G03F7/40
Inventor 傅百军
Owner 绍兴市嘉诚感光材料有限公司
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