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Mask plate storage conveying device and method

A technology for transportation devices and mask plates, which is applied in transportation and packaging, manual transportation devices, conveyor control devices, etc., can solve the problems of dust, affecting the quality of photolithography process, and the production process cannot be carried out normally, so as to simplify the structure, The effect of improving the level of automation and reducing the volume

Active Publication Date: 2019-07-19
YUNGU GUAN TECH CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The mask is a key item that affects the performance of lithography. If there is a problem with the mask, such as being damaged or dusty, it will directly affect the quality of the lithography process and make the production process unable to proceed normally.

Method used

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  • Mask plate storage conveying device and method
  • Mask plate storage conveying device and method
  • Mask plate storage conveying device and method

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Embodiment Construction

[0043] The present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, but not to limit the present invention. In addition, it should be noted that, for the convenience of description, only some structures related to the present invention are shown in the drawings but not all structures.

[0044] In view of the above-mentioned background technology, the inventor analyzed that the main reason is that the storage box of the mask plate cannot be changed between the horizontal state and the vertical state, and vertical storage boxes and horizontal storage boxes are generally used in the storage and transportation of the mask plate. The mask plate in the vertical storage box is placed vertically, but the mask plate on the equipment using the mask plate needs to be placed horizontally, so it is necessary t...

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Abstract

The invention provides a mask plate storage conveying device and method. The mask plate storage conveying device comprises a first driving assembly, a second driving assembly and a storing box used for placing mask plates; the first driving assembly comprises a first main body part and a first movable part, and the second driving assembly comprises a second main body part and a second movable part; the first main body is fixed to the bottom wall of a base, and the first movable part is slidably connected with the first main body part in the first direction; the second main body part is fixed to the side wall of the base, and the second movable part is slidably connected with the second main body part in the second direction; the first direction is perpendicular or parallel to the bottom wall of the base, and the second direction is perpendicular to the first direction; and the end, near the side wall of the base, of the storing box is connected with the second movable part in a hingedmode, and the end, away from the side wall of the base, of the storing box is connected with the first movable part in a hinged mode. The mask plate storage conveying device and method are used for realizing the switching between a horizontal state and a vertical state of the storing box.

Description

technical field [0001] Embodiments of the present invention relate to display technology, and in particular, to a mask storage and transportation device and method. Background technique [0002] The photolithography process in the display panel manufacturing technology is the process of transferring the pattern on the mask (Mask) to the photoresist on the surface of the glass substrate or semiconductor wafer through optical imaging, and then through developing, etching, stripping, etc. Process steps, and finally form the required TFT array pattern on the glass substrate. The mask is a key item that affects the performance of lithography. If there is a problem with the mask, such as being damaged or dusty, it will directly affect the quality of the lithography process and make the production process unable to proceed normally. Among them, the storage, transportation and pick-and-place of the mask is one of the important reasons for its scratch and damage. Contents of the i...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B65G7/04B65G47/248B65G43/00B65D25/10B65D25/24
CPCB65D25/10B65D25/24B65G7/04B65G43/00B65G47/248
Inventor 窦晓宇吕孝鹏李伟丽王亚甘帅燕
Owner YUNGU GUAN TECH CO LTD
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