Polyimide precursor, precursor composition, polyimide, high temperature resistant transparent polyimide film and preparation method thereof
A technology of transparent polyimide and high temperature resistance, applied in the field of polymer material synthesis, can solve the problems of reduced mechanical properties and reduced heat resistance of high transparent polyimide, and achieves improved regularity, good light transmittance, The effect of improving the degree of plane orientation
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0056] A high-temperature-resistant transparent polyimide film, which is produced by thermal imidization method, and is obtained by casting a polyamic acid precursor composition and temperature-programmed treatment;
[0057] Wherein, the polyamic acid precursor accounts for the mass content of composition and is 10wt%;
[0058] The diamine monomer used is 2,2-bis[4-(4-aminophenoxy)phenyl]-1,1,1,3,3,3-hexafluoropropane, and the main dianhydride monomer is 4 , 4-(hexafluoroisopropylene) diphthalic anhydride, the dianhydride monomer is 4,4'-oxydiphthalic anhydride;
[0059] The main dianhydride monomer accounts for 70% of the total molar amount of dianhydride, and the controlled dianhydride monomer accounts for 30% of the total molar amount of dianhydride;
[0060] The temperature programming sequence is: room temperature—100°C (10min)—180°C (10min)—260°C (10min)—320°C (10min).
Embodiment 2
[0062] A high-temperature-resistant transparent polyimide film, which is produced by chemical imidization method, is obtained by mixing polyamic acid precursor composition and accelerator, casting and temperature-programmed treatment;
[0063] Wherein, the polyamic acid precursor accounts for the mass content of composition and is 10wt%;
[0064] The diamine monomer used is 2,2-bis[4-(4-aminophenoxy)phenyl]-1,1,1,3,3,3-hexafluoropropane, and the main dianhydride monomer is 4 , 4-(hexafluoroisopropylene) diphthalic anhydride, the dianhydride monomer is 4,4'-oxydiphthalic anhydride;
[0065] The main dianhydride monomer accounts for 70% of the total molar amount of dianhydride, and the controlled dianhydride monomer accounts for 30% of the total molar amount of dianhydride;
[0066] The accelerator is composed of pyridine and acetic anhydride in a mass ratio of 1:1, the mass ratio of the sum of the catalyst and dehydrating agent to the solvent is 3:7; the mass ratio of the prec...
Embodiment 3
[0069] A high-temperature-resistant transparent polyimide film, which is produced by chemical imidization method, is obtained by mixing polyamic acid precursor composition and accelerator, casting and temperature-programmed treatment;
[0070] Wherein, the polyamic acid precursor accounts for the mass content of composition and is 10wt%;
[0071] The diamine monomer used is 2,2-bis[4-(4-aminophenoxy)phenyl]-1,1,1,3,3,3-hexafluoropropane, and the main dianhydride monomer is 4 , 4-(hexafluoroisopropylene) diphthalic anhydride, the dianhydride monomer is 4,4'-oxydiphthalic anhydride;
[0072] The main dianhydride monomer accounts for 70% of the total molar amount of dianhydride, and the controlled dianhydride monomer accounts for 30% of the total molar amount of dianhydride;
[0073] The accelerator is composed of pyridine and acetic anhydride in a mass ratio of 1:1; the mass ratio of the sum of the catalyst and dehydrating agent to the solvent is 3:6; the mass ratio of the prec...
PUM
Property | Measurement | Unit |
---|---|---|
glass transition temperature | aaaaa | aaaaa |
tensile strength | aaaaa | aaaaa |
glass transition temperature | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com