Optical filter and preparation method thereof, fingerprint recognition module and electronic device
A technology of filter and long-wave-pass film system, applied in filter, character and pattern recognition, optics, etc., can solve the problem of unable to meet the requirements of fingerprint sensor module use
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Embodiment 1
[0043] An embodiment of the present invention provides an optical filter, the optical filter is a near-infrared optical filter through 830-950nm. figure 1 A structural schematic diagram of an optical filter provided for an embodiment of the present invention, such as figure 1 As shown, the filter includes a transparent substrate 100 and a first long-wave pass film system 200 and a second long-wave pass film system 300 respectively arranged on both sides of the transparent substrate 100; the first long-wave pass film system 200 and the second long-wave pass film system All systems 300 include alternately stacked high-refractive-index film layers 401 and low-refractive-index film layers 402; the film system structure of the first long-wave pass film system 200 includes (0.5HL0.5H)^10, and the The central wavelength of the transition zone is 700-900nm; the film structure of the second long-wave pass film system 300 includes (0.5HL0.5H)^14, and the transition zone center wavelengt...
Embodiment 2
[0068] The embodiment of the present invention also provides a method for preparing an optical filter, which can be completed in a vacuum sputtering coating machine, and the optical filter as in the first embodiment above can be prepared by this method. The method includes:
[0069] forming a first long-wave pass film system and a second long-wave pass film system respectively on both sides of the transparent substrate to obtain an optical filter;
[0070] Wherein, the first long-wave pass film system and the second long-wave pass film system both include alternately stacked high-refractive index film layers and low-refractive index film layers; the film structure of the first long-wave pass film system includes (0.5HL0.5H)^ 10. The central wavelength of the transition zone of the first long-wave pass film system is 700-900nm; the film structure of the second long-wave pass film system includes (0.5HL0.5H)^14, and the transition zone center wavelength of the second long-wave p...
Embodiment 3
[0090] The embodiment of the present invention also provides a fingerprint identification module, which includes the optical filter of the first embodiment above.
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