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Polarization-independent grating based on covered refractive index matching layer and its preparation method

A refractive index matching layer and refractive index technology, which is applied in the optical field, can solve the problem that the design of polarization-independent gratings is relatively difficult, and achieve the effect of simple and efficient preparation method and high preparation tolerance.

Active Publication Date: 2021-06-04
成都精密光学工程研究中心
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] For reflective dielectric film gratings used in spectrum synthesis and chirped pulse amplification, it is generally necessary to have a relatively high line density. It is difficult to design a polarization-independent grating that achieves high diffraction efficiency within a certain bandwidth range.
Moreover, under special conditions of use (such as high temperature, high humidity, strong laser radiation, etc.), the stability of the grating will also be greatly challenged, and it is necessary to use effective methods to improve its working stability

Method used

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  • Polarization-independent grating based on covered refractive index matching layer and its preparation method
  • Polarization-independent grating based on covered refractive index matching layer and its preparation method
  • Polarization-independent grating based on covered refractive index matching layer and its preparation method

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Embodiment 1

[0033] Such as figure 1 As shown, it is a polarization-independent reflective dielectric grating covered with a refractive index matching layer for a central wavelength of 1064nm. The diffraction efficiency of -1 order is higher than 98.5% in the bandwidth range of 1050-1080nm under the incident light of the state under the incident condition of Littrow angle.

[0034] The grating includes a fused silica substrate 1, on which a reflective film 2 and a grating functional layer 3 are sequentially plated; the grating functional layer 3 includes an oxide dielectric film connection layer 3-1, a single-layer oxide The object dielectric film grating layer 3-2 and the refractive index matching layer 3-3, and the single-layer oxide dielectric film grating layer 3-2 is etched into a grating groove structure.

[0035] The reflective film 2 is a multi-layer dielectric thin film with adjustable refractive index, and the number of periods is 14, which includes a high refractive index mater...

Embodiment 2

[0041] This embodiment is used to describe in detail the preparation method of the polarization-independent reflective dielectric grating covered with the refractive index matching layer in any of the foregoing embodiments.

[0042] Described preparation method comprises the steps:

[0043] S1, on the fused silica substrate 1, the reflective film 2, the oxide dielectric film connection layer 3-1, and the single-layer oxide dielectric film grating layer 3-2 are sequentially plated, such as figure 2 shown;

[0044] The single-layer oxide dielectric film grating layer 3-2 is prepared by ion beam sputtering or electron beam evaporation, and its material is SiO 2 ;

[0045] S2, on the single-layer oxide dielectric film grating layer 3-2, prepare a grating mask by holographic exposure or electron beam exposure, and perform grating groove etching by reactive ion etching, such as image 3 shown;

[0046] The groove structure of the grating is a rectangular groove or a trapezoidal...

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Abstract

The invention discloses a wide-band polarization-independent reflective dielectric grating with a central wavelength in the near-infrared band and a high-line density covering a refractive index matching layer and a preparation method thereof, and relates to the field of optics. The grating is sequentially plated with a reflective film (2) and a grating functional layer (3) on a fused silica substrate (1). The grating structure provided by the present invention has a diffraction efficiency higher than 98.5% in the bandwidth range of 1050-1080 nm under the Littrow angle incident condition for TE mode and TM mode, and the highest diffraction efficiency exceeds 99.5%, and has a higher diffraction efficiency than ordinary gratings. The preparation tolerance can realize high-efficiency diffraction of polarization-independent incident light; in addition, it can be prepared by holographic exposure combined with reactive ion etching, and the refractive index matching layer prepared by atomic layer deposition can protect the grating structure. Improve the stability of the grating under special working environment conditions such as high temperature, high humidity, and laser irradiation, and the preparation method is simple and efficient, and has important application prospects in the field of high-power lasers.

Description

[0001] Technical field [0002] The invention relates to the field of optics, in particular to a broadband polarization-independent reflective dielectric grating with a central wavelength in the near-infrared band and a high-line density covering a refractive index matching layer and a preparation method thereof. Background technique [0003] In current high-power laser systems, the output power of a single laser is limited by nonlinear effects, thermal damage and other factors, making it difficult to achieve high-power laser output. The use of spectral synthesis beam technology can effectively increase the power density per unit area, which is an effective technical way to increase the output power of the laser system. A common technical path to achieve high-efficiency spectral synthesis is to use the dispersion characteristics of reflective dielectric gratings to achieve common-aperture synthesis of sub-beams of different wavelengths under certain incident conditions. The l...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B5/18
CPCG02B5/1847G02B5/1857G02B5/1861
Inventor 张明骁马平卢忠文蒲云体乔曌吕亮邱服民
Owner 成都精密光学工程研究中心
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