Preparation method of low dislocation indium antimonide (111) direction single crystal
An indium antimonide and low dislocation technology, which is applied in the field of preparation of low dislocation indium antimonide oriented single crystals, can solve problems such as difficulty in drawing and easy occurrence of polycrystals, and achieve the effects of reducing dislocations, stabilizing performance, and broadening applications
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[0026] Using the same steps and process conditions as Comparative Example 1 to prepare indium antimonide Direction of single crystal, after the end of the crystal pulling process of the conical end section, stop the rotation of the crucible, the rotation of the seed crystal and the pulling of the seed crystal, and reduce the heating power to make the indium antimonide The temperature of the surface of the single crystal in the direction drops to 300℃, and keeps it at 300℃ for 48h, and then continues to reduce the heating power to ensure that the indium antimonide is reduced at a temperature drop rate of 35℃ / h. The temperature of the single crystal is cooled down to room temperature, and then placed for 18 hours before taking it out to obtain low dislocation indium antimonide Direction single crystal.
[0027] To the prepared low dislocation indium antimonide The iso-diameter section of the single crystal is sliced in the direction, and the iso-diameter section is etched with ...
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