A kind of ultra-thin silicon nanosheet photocatalyst and its preparation method and application

A technology of silicon nanosheets and photocatalysts, applied in chemical instruments and methods, physical/chemical process catalysts, inorganic chemistry, etc. problem, to achieve the effect of low process cost, promotion of performance and application research, and large application potential

Active Publication Date: 2021-07-23
HEFEI UNIV OF TECH
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] At present, the methods for preparing silicon nanosheets include chemical vapor deposition, graphene oxide template method, magnesia thermal reduction method and silicide exfoliation method, but these methods still have many deficiencies, such as: chemical vapor deposition method is high in cost and low in output. It is suitable for large-scale production; the graphene oxide template method and magnesia thermal reduction method not only have complicated process flow, but also introduce impurities and structural defects that are difficult to completely remove, which will affect the performance of silicon nanosheets; the silicide exfoliation method needs to prepare CaSi 2 Layered precursors, the precursors are stripped into flakes and then reduced to silicon nanosheets. The process is complicated, the output is small, and the obtained silicon nanosheets are easily oxidized

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  • A kind of ultra-thin silicon nanosheet photocatalyst and its preparation method and application
  • A kind of ultra-thin silicon nanosheet photocatalyst and its preparation method and application
  • A kind of ultra-thin silicon nanosheet photocatalyst and its preparation method and application

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Embodiment 1

[0032] This embodiment prepares ultra-thin silicon nanosheet photocatalyst according to the following steps:

[0033] (1) Weigh 1g of commercial crystalline silicon powder and soak in liquid nitrogen for 12 hours;

[0034] (2) Take out the soaked crystalline silicon powder, and after the liquid nitrogen is completely volatilized, then disperse the crystalline silicon powder into 200mL of isopropanol and water in a mixed solvent with a volume ratio of 1:1, and ultrasonically treat it at 120W for 8h. After ultrasonication, the sample was centrifuged at 1000rpm for 30min, and the supernatant was taken to obtain a suspension of ultra-thin silicon nanosheets;

[0035] (3) The ultrathin silicon nanosheet suspension was centrifuged at 10000 rpm for 30 min, and the precipitate was washed with deionized water and freeze-dried for 48 h to obtain the ultrathin silicon nanosheet photocatalyst.

[0036] figure 2 (a), (b), and (c) are successively the XRD, Raman, and XPS characterization...

Embodiment 2

[0043] (1) Weigh 400 mg of commercial crystalline silicon powder and soak in liquid nitrogen for 24 hours;

[0044] (2) Take out the soaked crystalline silicon powder, and after the liquid nitrogen is completely volatilized, disperse the crystalline silicon powder into a mixed solvent composed of 100mL of isopropanol and water at a volume ratio of 1:1, and ultrasonically treat it at 100W for 4h. After ultrasonication, the sample was centrifuged at 2000rpm for 30min, and the supernatant was taken to obtain a suspension of ultra-thin silicon nanosheets;

[0045] (3) The ultrathin silicon nanosheet suspension was centrifuged at 10000 rpm for 30 min, and the precipitate was washed with deionized water and freeze-dried for 48 h to obtain the ultrathin silicon nanosheet photocatalyst.

[0046] After characterization, the ultra-thin silicon nanosheets obtained in this example have a thickness of 0.9-1.8nm and a diameter of 1.5-6.5μm; they were tested for their visible light photocata...

Embodiment 3

[0048] (1) Weigh 600 mg of commercial crystalline silicon powder and soak in liquid oxygen for 48 hours;

[0049] (2) Take out the soaked crystalline silicon powder, and after the liquid oxygen is completely volatilized, disperse the crystalline silicon powder into 200mL of isopropanol and water in a mixed solvent with a volume ratio of 1:1, and ultrasonically treat it for 6 hours at a power of 120W. After ultrasonication, the sample was centrifuged at 3000rpm for 30min, and the supernatant was taken to obtain a suspension of ultra-thin silicon nanosheets;

[0050] (3) The ultrathin silicon nanosheet suspension was centrifuged at 10000 rpm for 30 min, and the precipitate was washed with deionized water and freeze-dried for 48 h to obtain the ultrathin silicon nanosheet photocatalyst.

[0051] After characterization, the thickness of the ultra-thin silicon nanosheets obtained in this example is 0.6-1.5nm, and the size is 0.3-5.0μm; it is tested for the performance of visible li...

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Abstract

The invention discloses an ultra-thin silicon nanosheet photocatalyst and its preparation method and application. It uses crystalline silicon powder as a precursor, disperses it into a solvent after being dipped in an ultra-low temperature liquid gas, and then assisted the liquid phase by ultrasonic waves. The ultra-thin silicon nano-sheet suspension is obtained by peeling off, and after the suspension is centrifuged and freeze-dried, an ultra-thin silicon nano-sheet photocatalyst with a thickness of 0.3-2.1 nm and a size of 0.1-6.5 μm is obtained. When the silicon nanosheets obtained in the present invention are used for visible light photocatalytic hydrogen production, the hydrogen production efficiency can reach 5.102 mmol h ‑1 g ‑1 , the photocatalytic hydrogen production efficiency is about 93 times higher than that of the original crystalline silicon powder. The method for preparing silicon nanosheets disclosed by the invention is simple to operate, low in cost, and can be prepared in large quantities, and the obtained silicon nanosheets have excellent visible-light photocatalytic hydrogen production performance, providing a new method for building stable and efficient photolysis of water for hydrogen production materials. train of thought.

Description

technical field [0001] The invention belongs to the field of nano-semiconductor photocatalysis, and in particular relates to a method for preparing an ultra-thin silicon nanosheet photocatalyst. Background technique [0002] Since the 21st century, the energy crisis and environmental pollution problems faced by mankind have become increasingly serious. Finding efficient and clean renewable energy is the only way for the sustainable development of human society. Among many new energy sources, hydrogen, which has many advantages such as cleanness, high efficiency, storage and transportation, is the most ideal green energy to replace traditional energy such as coal. Therefore, as a promising hydrogen production method, photocatalytic hydrogen production has been highly valued by countries all over the world. With the efforts of researchers, TiO has been discovered 2 , CdS, ZnO and a series of photocatalyst materials with excellent performance. But TiO 2 , ZnO and other wide...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B01J21/06C01B3/04
CPCB01J21/06B01J35/0013B01J35/004C01B3/042C01B2203/0277Y02E60/36
Inventor 王岩蔡蕊张剑芳崔接武秦永强郑红梅张勇吴玉程
Owner HEFEI UNIV OF TECH
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