Wet etching equipment

Abstract

A wet etching apparatus is provided. A liquid absorb device is provided on that cover plate of the etching groove in the wet etching apparatus, the etching solution remaining on the cover plate of theetching groove is quickly absorbed, A liquid etch solution remaining on that cover plate of the etching groove is prevented from being sputtered or drip onto the glass substrate, the product abnormality caused by the etching solution remaining on the cover plate of the etching groove is reduced, Improving the Mura on the glass substrate, increasing the yield of the product, and in the maintenanceof the wet etching equipment, the equipment operator does not need to manually clean the residual liquid medicine on the cover plate of the etching tank body, thus reducing the workload of the equipment operator and occupational injury; In addition, since the residual etching solution on the cover plate of the etching groove is reduced, the detection and observation of the inside of the etching groove by the equipment operator can be facilitated, and the accuracy of the process parameter acquisition can be improved.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a wet etching device. Background technique [0002] Thin Film Transistor (TFT) is the main driving element in current Liquid Crystal Display (LCD) and Active Matrix Organic Light-Emitting Diode (AMOLED). It is related to the display performance of the flat panel display device. [0003] Most of the liquid crystal displays currently on the market are backlight liquid crystal displays, which include a liquid crystal display panel and a backlight module. The working principle of the liquid crystal display panel is to pour liquid crystal molecules between the thin film transistor array substrate (ThinFilm Transistor Array Substrate, TFT Array Substrate) and the color filter (ColorFilter, CF) substrate, and apply pixel voltage on the two substrates respectively. and the common voltage, through the electric field formed between the pixel voltage and the common voltage to control the...

AI Technical Summary

Problems solved by technology

[0004] Currently, the wet etching process is widely used in the production process of the panel. The chemical solution used in the wet etching process is easy to remain on the cover plate (Cover) of the etching tank through sputtering or liquefaction during the process. The concentration of the liquid medicine remaining on the cover plate of the etching tank will be different from that in the liquid medicine tank (Tank) over time. In the subsequent wet etching process, the liquid medicine remaining on the cover plate will The liquid may be splashed or dripped onto the glass substrate, resulting in uneven etching in local areas and Mura

In the prior art, in the maintenance of wet etching equipment, operators need to use a water gun to clean the residual liquid medicine on the cover plate of the etching tank, and then wipe it with a dust-free cloth. The maintenance workload is relatively large, and Operators have been in this working environment for a long time, which will cause certain harm to the body; in addition, the residual liquid medicine on the cover plate of the etching tank will affect the outside world to monitor and observe the inside of the equipment, resulting in certain errors in the obtained process parameters

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