Wafer drying device and method based on Marangoni effect

Abstract

The invention discloses a wafer drying device and method based on a Marangoni effect, wherein the wafer drying device comprises: a water tank for containing deionized water; a wafer lifting device forlifting a wafer from the deionized water; a nitrogen gas source; a nitrogen gas spraying system for spraying a hot nitrogen gas onto the meniscus area of the wafer and deionized water when the waferis lifted in order to induce a temperature gradient in the meniscus area to generate a Marangoni flow downward from the meniscus area, so as to peel off a water absorbing film and achieve ultra-cleandrying of the wafer; and a controller for controlling the wafer lifting device, the nitrogen gas source and the nitrogen gas spraying system. The device and method perform Marangoni drying by using the green environment-friendly hot nitrogen gas instead of a combustible explosive and toxic organic steam, avoids the use of a protection device, simplifies a supply system and improves safety. The wafer lifting device is fixed at two positions and lifts the wafer step by step in order to prevent inability to dry a clamp-wafer contact area and to achieve complete wafer drying.

Description

technical field [0001] The invention relates to the technical field of wafer processing, in particular to a wafer drying device and drying method based on thermal Marangoni effect. Background technique [0002] Wafer drying methods in the related art mainly include spin drying and Marangoni (Marangoni) drying. [0003] For spin drying, the centrifugal force generated by the rotation of the wafer is used to peel off the water layer adsorbed on the surface of the wafer. But after the rotation, there is still a thick layer of water film on the surface of the wafer, the thickness of which is at least 200nm. This residual water film creates many drying defects. [0004] For Marangoni drying, during the process of pulling the wafer from deionized water, a low surface tension substance or IPA steam is sprayed at the meniscus of the air-liquid interface to induce the Marangoni effect, and the complete peeling off of the entrained water film on the wafer surface is achieved. and d...

AI Technical Summary

Problems solved by technology

Marangoni drying is a more advanced drying technology than rotary drying. However, due to the flammability and toxicity of the IPA steam currently used, a large number of protective measures need to be adopted in the industry to ensure the safe and reliable operation of the drying system. Therefore, the supply of organic steam Gas system and wafer drying unit are both complex

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