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High-order diffraction suppression raster of quasi-random structure

An advanced diffraction and quasi-random technology, applied in the field of diffractive optics, can solve problems such as the processing accuracy of controlled primitives and the influence of primitive processing accuracy on performance, and achieve the effect of improving the accuracy of spectral measurement

Active Publication Date: 2018-11-06
LASER FUSION RES CENT CHINA ACAD OF ENG PHYSICS
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Problems solved by technology

Considering the particularity of its layout structure, electron beam lithography is mainly used for processing, but the processing accuracy of primitives has always been an important factor affecting its performance
[0006] In order to overcome the problem that the performance of the existing advanced diffraction suppression grating is limited by the machining accuracy of the element, the present invention aims to provide a grating that can effectively suppress the advanced diffraction without precisely controlling the shape and size parameters of the element itself, and has a large process tolerance. raster

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  • High-order diffraction suppression raster of quasi-random structure
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  • High-order diffraction suppression raster of quasi-random structure

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Embodiment

[0034] This embodiment provides an advanced diffraction suppression grating with a quasi-random structure, refer to figure 1 and figure 2 . It includes: an opaque base 1; a plurality of polygonal primitives 2 with the same shape and area and not intersecting each other are set on the opaque base 1, and a plurality of trapezoidal regions 3 are arranged on the opaque base 1, and a plurality of trapezoidal The area 3 is arranged periodically in a square lattice, and the period of the square lattice is d. There is only one polygonal primitive 2 in each trapezoidal area 3 , and the centers of the polygonal primitives 2 are randomly distributed in the trapezoidal area 3 .

[0035] It should be noted that the embodiment of the present invention does not limit the specific structure of the polygonal primitive, which may be a regular polygon, a non-regular polygon, or a circle; the embodiment of the present invention does not limit the specific height of the trapezoidal area. See ...

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Abstract

The present invention discloses a high-order diffraction suppression raster of a quasi-random structure, comprising a non-transparent substrate. The non-transparent substrate is provided with a plurality of polygonal primitives having the same shape and the same area and not intersecting each other, the non-transparent substrate is provided with a plurality of trapezoidal regions thereon, the plurality of trapezoidal regions are periodically arranged in a square lattice, the period of the square lattice is d, and each of the trapezoidal regions has only one polygon primitive. The centers of the polygonal primitives are randomly distributed within the trapezoidal regions. Compared with the existing high-order diffraction suppression raster, the process difficulty is effectively reduced, theproblem of re-introduction of high-order diffraction by the processing error of the primitives is solved, and 2n- and 3n-order high-order diffraction can be effectively suppressed in each waveband ofthe infrared light, visible light, extreme ultraviolet, soft X-ray, and the like, thereby providing technical guarantee and process support for improving spectral measurement accuracy and monochromatic spectral purity.

Description

technical field [0001] The invention relates to the field of diffractive optics, in particular to an advanced diffraction suppression grating with a quasi-random structure. Background technique [0002] Advanced Diffraction Suppression Grating is a new type of grating that can effectively reduce the intensity of advanced diffraction. It uses a variety of elements arranged according to certain rules to replace the grooves, grooves, slots and other structures in traditional gratings, and is expected to fundamentally solve the problem of high-order harmonic pollution in the spectral measurement of broadband light sources and the monochromatization process. Considering the particularity of its layout structure, electron beam lithography is mainly used for processing, but the processing accuracy of primitives has always been an important factor affecting its performance. [0003] A representative design is called quantum lattice grating (Wang C, Kuang L, et al.Rev.Sci.Instrum, 2...

Claims

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Application Information

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IPC IPC(8): G02B5/18
CPCG02B5/1861G02B5/1866
Inventor 魏来陈勇杨祖华范全平巫殷忠曹磊峰
Owner LASER FUSION RES CENT CHINA ACAD OF ENG PHYSICS
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