Semiconductor device
A semiconductor and device technology, applied in the field of semiconductor integrated circuits, can solve problems such as gate oxide layer breakdown, hot carrier injection, and reliability of high-voltage components, and achieve the effects of increasing depletion, improving reliability, and simple structure
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
no. 1 example
[0036] Such as figure 1 Shown is a structural diagram of the semiconductor device of the first embodiment of the present invention, the semiconductor device of the first embodiment of the present invention includes:
[0037] The channel region 2 is doped with the second conductivity type and the drift region 3 is doped with the first conductivity type.
[0038] The channel region 2 is in lateral contact with the drift region 3 .
[0039] A gate structure formed by stacking a gate dielectric layer 6 and a polysilicon gate 7, the gate structure covers the surface of the channel region 2 and extends to the surface of the drift region 3, and is covered by the gate structure The surface of the channel region 2 is used to form a channel. Preferably, the gate dielectric layer 6 is a gate oxide layer.
[0040] The heavily doped source region 4 of the first conductivity type is formed on the surface of the channel region 2 and self-aligned with the gate structure for the first time....
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com