Inflatable thin film method for preparing micro-nano structure of flexible thin film substrate
A technology of micro-nano structure and flexible film, which is applied in the manufacture of nano-structures, the formation of specific nano-structures, the manufacture of micro-structure devices, etc., can solve the problem that the flexible film substrate and the reticle are not tightly attached and cannot meet the high-precision requirements of micro-nano devices and other problems, to achieve the effect of high process repeatability and reliability, high consistency, and batch preparation
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Embodiment 1
[0028] Such as figure 1 As shown in middle 1-1, the flexible film substrate 2 is fixed by two aluminum fixtures, the upper fixture 1 and the lower fixture 3, wherein the flexible film substrate 2 is a polyimide film substrate;
[0029] Such as figure 1 As shown in 1-2, AZ1500 photoresist 4 with a thickness of 600nm is evenly coated on the upper surface of the polyimide film substrate, and baked on a hot plate at 100°C for 60 seconds;
[0030] Such as figure 1 As shown in middle 1-3, fix the aluminum backboard 5 with air-filled holes on the lower fixture 3;
[0031] Such as figure 1 As shown in 1-4, take a traditional hard mask plate 6 and install it on the mask holder of the contact exposure machine, and use the lifting system of the contact exposure machine to adjust the gap between the mask plate 6 and the photoresist 4 as 40um;
[0032] Such as figure 1 As shown in 1-5, a certain volume of air 7 is filled into the sealed cavity through the air hole, and under the effe...
Embodiment 2
[0037] Such as figure 1 As shown in middle 1-1, the flexible film substrate 2 is fixed by two aluminum fixtures, the upper fixture 1 and the lower fixture 3, wherein the flexible film substrate 2 is a polyethersulfone film substrate;
[0038] Such as figure 1 As shown in 1-2, AZ3100 photoresist 4 with a thickness of 1.2um is evenly coated on the upper surface of the polyethersulfone film substrate, and baked on a hot plate at 100°C for 150 seconds;
[0039] Such as figure 1 As shown in middle 1-3, fix the aluminum backboard 5 with air-filled holes on the lower fixture 3;
[0040] Such as figure 1 As shown in 1-4, take a traditional hard mask plate 6 and install it on the mask holder of the contact exposure machine, and use the lifting system of the contact exposure machine to adjust the gap between the mask plate 6 and the photoresist 4 as 20um;
[0041] Such as figure 1 As shown in 1-5, a certain volume of air 7 is filled into the sealed cavity through the air hole, and...
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