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Ontology-based architectural pattern modeling method

A modeling method and pattern technology, applied in software maintenance/management, reverse engineering, etc., can solve problems such as lost documents, update delays, initial design attenuation, etc., and achieve the effect of convenient reuse, improved accuracy, and strong abstraction ability

Active Publication Date: 2018-04-06
SOUTHEAST UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Unfortunately, architecture documents are often outdated, updated with significant delays, and inconsistent in detail and form
Furthermore, the architecture of a system is often documented as it is developed, and the evolutionary process leads to decay of the initial design and leads to a separation between the design and the built architecture
In other cases, development teams may lose documents during long-term maintenance and handover, or they are not always available, such as some open source software

Method used

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  • Ontology-based architectural pattern modeling method
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  • Ontology-based architectural pattern modeling method

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Embodiment Construction

[0029] Below in conjunction with accompanying drawing, technical scheme of the present invention is described in further detail:

[0030] figure 1 A schematic flow diagram of ontology-based architectural pattern modeling method is given, and each step is expanded as follows.

[0031] 1. Pattern library search

[0032] The constructed conceptual model and domain model are stored in the form of OWL for unified management, forming a "pattern library" of architectural patterns, so that these models can be reused for the identification of architectural patterns, and the organizational relationship of existing ontology can be used to increase Quantitative expansion of new concepts and new domain knowledge. When using the existing models in the knowledge base for pattern recognition, the appropriate model can be directly selected to match the system to be recognized, or it can be expanded based on the existing model, and then matched with the system to be recognized. Searching for...

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Abstract

The invention discloses an ontology-based architectural pattern modeling method. According to the method, description logic is used to perform concept modeling of an architectural pattern, a domain knowledge model is further introduced, finally a mapping relation between a high-level abstract concept and system realization is established, and therefore the model is applied to recognition of the architectural pattern. Considering extension and reuse problems of domain knowledge, the domain knowledge is organized into a netlike hierarchical structure during modeling. In the structure, a conceptmodel is at a high level, more domain knowledge is combined step by step at all lower levels to explain the high-level concept. New knowledge can be incrementally added into any node at any level andalso can be selectively reused to establish a new concept. The ontology-based architectural pattern modeling not only has the abstracting ability of concept modeling but also can utilize the domain knowledge to serve architectural pattern recognition, and therefore the automation degree and precision of architectural pattern recognition are improved.

Description

technical field [0001] The invention relates to the field of reverse engineering of software, in particular to an architecture pattern modeling method based on ontology. Background technique [0002] The software architecture is the main technical outcome of the early development phase, describing the functional elements of the system and their interrelationships. In system architecture, information about the patterns used is an important part of architectural knowledge today. Many architectural design methodologies consider architectural patterns as fundamental design concepts because architectural patterns provide proven solutions to recurring design problems in the context of systems. Information about the patterns used in a product can also provide valuable insights into the quality attributes of the software product evaluation system, i.e., performance and reliability, etc. Therefore, in the process of development, maintenance and evolution of software systems, a deep...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G06F8/74
CPCG06F8/74
Inventor 熊壬浩李必信
Owner SOUTHEAST UNIV
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