Screen plate cleaning solution and use method thereof

Abstract

The invention relates to a screen plate cleaning solution, which contains an alkali compound and a resin stripping agent, and has a pH value of 10-14. According to the present invention, through the reaction among the alkali compound, the resin stripping agent and the resin layer of the screen plate, the regenerated screen plate is prepared by using the screen plate cleaning solution of the present invention, such that the resin layer of the screen plate can be effectively removed, and the oxidation and dark reaction between the metal net of the screen plate can be effectively prevented so asto improve the yield and the quality of the screen printing.

Description

technical field [0001] The invention relates to a cleaning liquid and a method for using the same, in particular to a screen cleaning liquid for printing and a method for using the same. Background technique [0002] With the multiplexing and miniaturization of electronic devices, the circuit substrates of electronic devices must be equipped with high-density electronic components and wiring. Metal screen printing has been applied to the manufacturing process of these circuit substrates to meet the miniaturization of electronic components and distribution line requirements. The process of metal screen printing electronic circuits includes the following steps: first, coating a photosensitive emulsion (for example: acrylic resin) on the metal mesh cloth with warp and weft; second, exposing and developing the photosensitive emulsion to form a screen pattern (ie Photosensitive emulsion layer with miniaturized ink penetration holes after development); then, applying pressure to ...

AI Technical Summary

Problems solved by technology

like Figure 1A As shown, the metal mesh cloth 1 has a warp thread 11, a weft thread 12, a warp and weft interweaving place 13, and a mesh 14. On a poorly cleaned metal mesh cloth 1, a dark reaction film 15 is generated on the surface of the warp thread 11 or the weft thread 12, and the warp and weft thread interlacing place 13 Emulsion 2 easily remains in the fine mesh 14, especially, such as Figure 1B As shown, the cleaning method of the commercially available cleaning solution cannot penetrate deep into the gap of the warp and weft interweaving 13 of the warp 11 and the weft 12, resulting in photosensitive emulsion 2 remaining in it

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