Polyether sulfone resin containing methoxy diphenyl sulfone ether group and its synthesis method and application

Abstract

The invention discloses a polyether sulfone resin containing a methoxy diphenyl sulfone ether group and its synthesis method and application. The polyether sulfone resin has a structural formula shownin the description. In the formula, R1, R2, and R3 respectively represent H and -OCH3, two of R1, R2 and R3 simultaneously represent H and the rest one represents -OCH3, and n is 2-2000. The synthesis method utilizes a component A: 4, 4'-dihydroxydiphenyl sulfone, a component B: 4, 4'-dichlorodiphenyl sulfone and a component C: metal methoxy diphenyl sulfone phenate as reaction monomers, utilizessulfolane as a solvent, utilizes alkali carbonate as a salt-forming agent and utilizes a solution polymerization technology. Through use of the metal methoxy diphenyl sulfone phenate monomer as a capping agent in the PES polymer, the polyether sulfone resin containing a methoxy diphenyl sulfone ether group has chlorine content less than 900 ppm, light transmittance greater than 83%, haze less than 3% and a yellowness index less than 15, has significantly improved transparency and color level and has the characteristics of long-term high-temperature resistance to inhibit discoloration.

Description

technical field [0001] The invention belongs to the technical field of polymer materials, and in particular relates to a polyethersulfone resin containing methoxydiphenylsulfone ether groups and a synthesis method and application thereof. Background technique [0002] The commercially available polyethersulfone (PES) is produced as dichlorodiphenyl sulfone as a monomer, and for thermal stability and molecular weight considerations, the end groups of the polymer chains all contain bonded chlorine, and the content is generally above 3000ppm. The content of polymer-bonded halogens, especially chlorine, is too high for many applications due to the potential for corrosion of metals and is generally not acceptable for flame retardancy. Applications in the electronics field, such as switches, circuit breakers, fuses, IC holders, housings, foils, typically require very low chlorine levels, eg less than 900 ppm. In addition, known biphenylpolyethersulfone polymers also have relative...

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Problems solved by technology

In addition, known biphenylpolyethersulfone polymers also have a high residual solvent content

[0003] Patent CN102365312B discloses a preparation method for preparing PPSU with low chlorine content. By adding monochlorodiphenyl sulfone, the effect of reducing the content of chlorine end groups to below 800ppm can be achieved, and at the same time, the elongation at break and the PPSU under low shear can be improved. Fluidity, but studies have found that monochloro and phenyl sulfones have low activity, resulting in more unreacted monomer residues, which are not easily removed during the post-treatment purification process, resulting in deterioration of the heat resistance and color of the resin. Obvious changes, and at the same time, bubbles will be generated due to gasification of small molecules, which will bring hidden dangers to normal use

The method for preparing PPSU published in patent CN 102498158 A is to prepare a resin with a chlorine end group content of less than 400 ppm and a lighter color by adding an aqueous metal hydroxide solution in the later stage of polymerization, but this preparation process is difficult to control stably and exist Potential safety hazard, because during the polymerization stage, the material system is at a high temperature higher than 190°C. If an aqueous solution is added, a large amount of water vapor and high-temperature materials will be splashed or even sprayed out of the polymerization equipment

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