Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method for processing plant material by use of plasma

A plasma and plant material technology, which is applied in the field of plasma treatment of plant materials, can solve the problems of continuous operation, large volume of vacuum chamber, and limited application range, etc.

Inactive Publication Date: 2017-12-05
LUOYANG TMAXTREE BIOTECH CO LTD
View PDF8 Cites 6 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] At present, non-equilibrium cold plasma can be generated under low pressure conditions, but it needs to be completed in a vacuum chamber, and continuous operation cannot be realized. At the same time, due to the large volume of the vacuum chamber, the construction and maintenance costs are expensive, which greatly limits its application range.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for processing plant material by use of plasma
  • Method for processing plant material by use of plasma
  • Method for processing plant material by use of plasma

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0033] Using plasma to treat Arabidopsis seeds, the steps are as follows:

[0034] (1) Put 100 mature seeds of Arabidopsis thaliana into each petri dish, spread them flat in the petri dish, and place the petri dish directly below the plasma outlet;

[0035] (2) Start the plasma mutagenesis breeding instrument, release the plasma jet, and the processing time is respectively 0s, 30s, 60s, 90s, 120s, 150s;

[0036] (3) Take out the Arabidopsis seeds, utilize 10% sodium hypochlorite to sterilize the Arabidopsis seeds after the plasma treatment, then inoculate on the MS solid medium, cultivate in the light incubator, and the roots of the Arabidopsis seedlings are cultivated along the The basal surface grows vertically downward.

[0037] After cultivating for a period of time, count the germination rate, seedling root length and seedling fresh weight of Arabidopsis under different treatment time, the results are as follows:

[0038] (1) After 1 week, the germination rate of Arabid...

Embodiment 2

[0043] Using plasma to treat sunflower sprouts, the steps are as follows:

[0044] (1) Put 15 sunflower sprouts in each petri dish, disperse them in the petri dish, place the petri dish directly below the plasma outlet;

[0045] (2) Start the plasma mutagenesis breeding instrument, release the plasma jet, and the processing time is 0min and 8min respectively;

[0046] (3) Take out the young sunflower buds and plant them in flowerpots with good ventilation, the soil thickness is 10cm, and place the flowerpots in a sunny place outdoors.

[0047] image 3 A graph showing the growth status of sunflowers cultivated for 2 months, image 3 a is the growth status figure of the 0min control group and the 8min treatment group on October 10, the 0min control group has bloomed flowers, and the 8min control group has only flower buds; image 3 a is the growth status graph on October 27, the flowers in the control group withered at 0 min, while the flowers in the treatment group bloomed ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a method for processing a plant material by the use of plasma. The plasma is a normal-pressure room-temperature plasma and is generated after a naked metal electrode discharges under the conditions of normal pressure and room temperature. The plant material contains plant seeds, plant buds, plant seedlings, plant callus or plant cells. By using the normal-pressure room-temperature plasma to irradiate the above plant material, a plant with excellent traits can be obtained. The plasma used in the method is generated under the conditions of normal pressure and room temperature without harsh environments such as vacuum, high pressure, etc. Different from methods for changing gene structure of plants such as DNA recombination, cell fusion, etc., the method is physical modification, has good safety and is simple to operate.

Description

technical field [0001] The invention belongs to the application field of plasma technology, in particular to a method for treating plant material by using plasma. Background technique [0002] At present, non-equilibrium cold plasma can be generated under low pressure conditions, but it needs to be completed in a vacuum chamber, which cannot achieve continuous operation. At the same time, due to the large volume of the vacuum chamber, the construction and maintenance costs are expensive, which greatly limits its application range. Currently, there are two types of plasma that can be generated under atmospheric pressure conditions. One is thermal plasma, such as plasma generated by an electric arc, with a temperature of about 10,000K. For heat-resistant materials, such as microbial materials and plant materials, its application is limited. ; The other is cold plasma, such as the plasma generated by corona discharge and dielectric barrier discharge, the temperature is close to...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): A01C1/00H05H1/24
CPCA01C1/00H05H1/24
Inventor 王立言毕鲜荣
Owner LUOYANG TMAXTREE BIOTECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products