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Cleaning acne mark-removing mask

A facial mask and anti-acne technology, applied in plant raw materials, cosmetics, skin diseases, etc., can solve problems such as side effects, achieve the effect of promoting the synthesis of collagen, preventing excessive accumulation of free radicals, and promoting the repair of acne scars

Inactive Publication Date: 2017-11-03
FOSHAN HUIFEN COSMETICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Most of these phototherapy methods stimulate skin regeneration, and there are certain risks or side effects. Therefore, people now prefer mild traditional Chinese medicine masks that can remove acne marks.

Method used

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  • Cleaning acne mark-removing mask
  • Cleaning acne mark-removing mask

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1～5

[0021] In Embodiments 1 to 5, the preparation method of the cleansing and acne scar removal mask of the present invention comprises the following steps:

[0022] (3) Glycerol, butylene glycol, propylene glycol, betaine, carbomer, xanthan gum, sodium hyaluronate, PEG-6 caprylic / capric glycerides, PEG-40 hydrogenated castor oil, allantoin, Deionized water is mixed into the stirring pot, stirred and heated to 85°C, and stirred evenly;

[0023] (4) Cool the temperature to 45°C, add triethanolamine, Wee chrysanthemum extract, false physalis extract, Dioscorea officinalis extract, phenoxyethanol, stir evenly, cool and discharge.

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PUM

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Abstract

The invention provides a facial mask for cleaning and removing acne scars, which comprises ingredients such as wedelia extract, pseudophysalis extract, yam yam extract, glycerin, butylene glycol, propylene glycol, betaine and the like. The facial mask of the present invention can alleviate the inflammatory reaction caused by cell damage, inhibit the generation of inflammatory mediators, and then reduce the skin damage caused by inflammation, and can effectively clean the skin, promote the disappearance of acne and the repair of acne scars; in addition, the facial mask can Improve blood circulation, promote collagen synthesis, achieve skin repair and regeneration; it can also deeply replenish water, form a water-locking wall, maintain the stability of the skin structure, and make the skin elastic.

Description

technical field [0001] The invention relates to the field of cosmetics, in particular to a facial mask for cleaning and removing acne marks. Background technique [0002] Acne is a symptom of destroying the stratum corneum of the skin and making the skin less resistant. In addition, the old dead cutin will not automatically decrease or fall off, but become the culprit of blocking pores, thus forming acne. In order to get rid of acne entanglement early, many beauty-lovers use various methods to treat, but often the opposite is true, resulting in acne scars that are difficult to remove. [0003] Now the methods of removing scars are: 1. Fractional laser: It can effectively remove scars, remove imprints caused by pigmentation, improve acne scars, and can also shrink pores, sterilize and reduce inflammation. 2. LED blue light: It stimulates the growth of subcutaneous collagen through laser, repairs acne scars, improves dark yellow skin tone, and enhances skin luster. At the sam...

Claims

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Application Information

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IPC IPC(8): A61K8/9789A61K8/9794A61K8/60A61K8/49A61K8/44A61K8/34A61Q19/08A61K36/8945A61P17/10
CPCA61K8/97A61K8/345A61K8/44A61K8/498A61K8/602A61K36/28A61K36/81A61K36/8945A61K2800/592A61Q19/08
Inventor 不公告发明人
Owner FOSHAN HUIFEN COSMETICS TECH CO LTD
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