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A kind of micro-filled concentrator based on metal substrate and preparation method thereof

A metal substrate and filling technology, which is applied in the field of structure and preparation of metal substrate micro-filling concentrators, can solve problems such as mismatching concentrators, achieve improved detection limits, various micro-processing methods, and enhanced effects Effect

Active Publication Date: 2019-03-01
XI AN JIAOTONG UNIV +1
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Problems solved by technology

[0005] The technical problem to be solved by the present invention is that in order to overcome the defects of the traditional concentrator in the micro gas detection system described in the background technology, a new type of metal substrate micro-packed concentrator is proposed based on MEMS technology. Structure design and preparation method

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  • A kind of micro-filled concentrator based on metal substrate and preparation method thereof
  • A kind of micro-filled concentrator based on metal substrate and preparation method thereof
  • A kind of micro-filled concentrator based on metal substrate and preparation method thereof

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Embodiment Construction

[0038] The invention will be further described in detail below in conjunction with the accompanying drawings and embodiments, but it is not used as a basis for any limitation on the invention.

[0039] The metal substrate of the micro-packed enricher of the present invention is brass H96 as an example, but it is not limited to H96, and can also be other metal or alloy materials with good performance; the enrichment object is ethylene gas as an example, and the choice of adsorbent material Carbosieve SII.

[0040] Such as figure 1 , figure 2 , image 3 , Figure 4 Shown, a kind of micro-filling concentrator based on metal substrate, comprises the polished encapsulation sheet 1 that distributes sequentially from top to bottom, the brazing layer (tin-lead solder) 2 of deposition, substrate layer 3, magnetic SiO deposited by controlled sputtering 2 Dielectric layer 4 and low pressure chemical vapor deposited Si 3 N 4 Dielectric layer 5, wherein, encapsulation sheet 1 and s...

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Abstract

The invention discloses a metal substrate-based micro-filling type enricher and a preparation method thereof. The metal substrate-based micro-filling type enricher comprises an encapsulating sheet, a brazing layer, a substrate layer and a dielectric layer, wherein the encapsulating sheet, the brazing layer, the substrate layer and the dielectric layer are sequentially distributed from top to bottom. The upper surface of the substrate layer is provided with a micro channel. The micro channel is filled with adsorbent materials. The side surface of the substrate layer is provided with an inlet and an outlet and the inlet and the outlet are respectively connected with a micro pipeline. A to-be-measured gas gets into the inlet of the substrate layer, and then gets out of the outlet of the substrate layer after passing through a gap in the adsorbent materials. The dielectric layer is provided with a pair of heating elements and a pair of sensitive elements. According to the technical scheme of the invention, the enricher has the advantages of miniaturization, high enrichment rate, low power consumption, stable material, easy integration, small dead volume, small heat capacity, low power consumption, fast temperature rise and the like. Compared with a silicon micro substrate, the enricher is better in heat conduction performance. The heating elements are prepared based on the thick-film technology, thus being simple in process and low in cost.

Description

technical field [0001] The invention relates to a structure and a preparation method of a metal substrate type micro-filling enricher based on MEMS (Micro-Electro-Mechanic System) technology. Background technique [0002] For public safety and health, it is very important to efficiently detect industrial toxic gases, flammable and explosive gases, components in chemical weapons, and chemical components related to diseases. Therefore we need analytical detector systems capable of detecting very low concentration atmospheres. In order to be able to accurately analyze and detect and respond to extremely low concentrations of harmful gases, a technology that can help existing analytical detection instruments to improve the detection limit is required. Therefore, for many trace analysis detection systems, the enricher is an essential and important part; through two stages of enrichment and desorption, the detection ability of these analysis detection systems can be increased sev...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01N1/40
CPCG01N1/405
Inventor 王海容韩宝庆李长青吴桂珊吴昌龙田汨龙段滨
Owner XI AN JIAOTONG UNIV
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